Mr. Wojtek J. Poppe Profile

Wojtek J. Poppe

at NVIDIA

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 13 March 2009 Paper

Tiny footprint programmable electrical defocus monitors

Wojtek Poppe, Patrick Au, Darshana Jayasuriya, Juliet Rubinstein, Andrew Neureuther

Proceedings Volume 7275, 727507 (2009) https://doi.org/10.1117/12.814448

KEYWORDS: Etching, Semiconducting wafers, Resistance, Design for manufacturing, Lithography, Process control, Photomasks, Structural design, Metrology, Calibration

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Proceedings Article | 18 March 2008 Paper

Hypersensitive parameter-identifying ring oscillators for lithography process monitoring

Lynn Wang, Wojtek Poppe, Liang-Teck Pang, Andrew Neureuther, Elad Alon, Borivoje Nikolic

Proceedings Volume 6925, 69250P (2008) https://doi.org/10.1117/12.773184

KEYWORDS: Oscillators, Lithography, Device simulation, Design for manufacturing, Transistors, Phase shifts, Semiconducting wafers, Instrument modeling, Manufacturing, Circuit switching

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Proceedings Article | 1 November 2007 Paper

Database and data analysis strategy for multi-designer testchips

Wojtek Poppe, Patrick Au, Darshana Jayasuriya, Andrew Neureuther

Proceedings Volume 6730, 67303T (2007) https://doi.org/10.1117/12.746739

KEYWORDS: Databases, Transistors, Data analysis, Data modeling, Process modeling, Data storage, Critical dimension metrology, Internet, Semiconducting wafers, Data mining

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Proceedings Article | 28 March 2007 Open Access

Collaborative platform, tool-kit, and physical models for DfM

Andy Neureuther, Wojtek Poppe, Juliet Holwill, Eric Chin, Lynn Wang, Jae-Seok Yang, Marshal Miller, Dan Ceperley, Chris Clifford, Koji Kikuchi, Jihong Choi, Dave Dornfeld, Paul Friedberg, Costas Spanos, John Hoang, Jane Chang, Jerry Hsu, David Graves, Alan Wu, Mike Lieberman

Proceedings Volume 6521, 652104 (2007) https://doi.org/10.1117/12.721199

KEYWORDS: Design for manufacturing, Photomasks, Device simulation, Computer aided design, Process modeling, Etching, Monochromatic aberrations, Manufacturing, Lithography, Chemical mechanical planarization

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Proceedings Article | 28 March 2007 Paper

Transistor-based electrical test structures for lithography and process characterization

Wojtek Poppe, Juliet Holwill, Liang-Teck Pang, Paul Friedberg, Qingguo Liu, Louis Alarcon, Andrew Neureuther

Proceedings Volume 6520, 65203N (2007) https://doi.org/10.1117/12.711613

KEYWORDS: Transistors, Line width roughness, Lithography, Critical dimension metrology, Databases, Semiconducting wafers, Structural design, Cryogenics, Photomasks, Metals

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Proceedings Article | 29 March 2006 Paper

Pattern noise in e-beam exposed sub-35-nm contacts

Wojtek Poppe, Alexander Liddle, Erik Anderson, Andrew Neureuther

Proceedings Volume 6153, 61533Z (2006) https://doi.org/10.1117/12.657055

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Electrons, Detection and tracking algorithms, Printing, Edge detection, Image processing, Chemically amplified resists, Electron beam lithography, Algorithm development

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Proceedings Article | 20 March 2006 Paper

Layout 'hot spots' for advancing optical technologies

Juliet Holwill, Gregory McIntyre, Wojtek Poppe, Andrew Neureuther

Proceedings Volume 6154, 61543M (2006) https://doi.org/10.1117/12.656819

KEYWORDS: Optical proximity correction, Polarization, Monochromatic aberrations, Photomasks, Printing, Phase shifts, Double patterning technology, Lithographic illumination, Optical lithography, Fourier transforms

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Proceedings Article | 13 March 2006 Paper

Platform for collaborative DFM

Wojtek Poppe, Luigi Capodieci, Andrew Neureuther

Proceedings Volume 6156, 61560E (2006) https://doi.org/10.1117/12.657042

KEYWORDS: Transistors, Critical dimension metrology, Device simulation, Design for manufacturing, Semiconductors, Optical proximity correction, Photomasks, Metrology, Image processing, Physics

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Proceedings Article | 13 March 2006 Paper

From poly line to transistor: building BSIM models for non-rectangular transistors

Wojtek Poppe, Luigi Capodieci, Joanne Wu, Andrew Neureuther

Proceedings Volume 6156, 61560P (2006) https://doi.org/10.1117/12.657051

KEYWORDS: Transistors, Critical dimension metrology, Device simulation, Optical proximity correction, Manufacturing, Capacitance, Design for manufacturability, Ions, Oscillators, Design for manufacturing

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Proceedings Article | 4 May 2005 Paper

Understanding quencher mechanisms by considering photoacid-dissociation equilibrium in chemically amplified resists

Seiji Nagahara, Lei Yuan, Wojtek Jacob Poppe, Andrew Neureuther, Yoshiyuki Kono, Atsushi Sekiguchi, Koichi Fujiwara, Tsuyoshi (Gary) Watanabe, Kazuo Taira, Shiro Kusumoto, Takanori Nakano, Tsutomu Shimokawa

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598949

KEYWORDS: Systems modeling, FT-IR spectroscopy, Diffusion, 3D modeling, Solids, Semiconducting wafers, Chemically amplified resists, Data modeling, Spectroscopy, Liquids

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Proceedings Article | 14 May 2004 Paper

Improved performance of Apex-E photoresist with the application of the electric field enhanced PEB

Jacob Poppe, Andrew Neureuther

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536540

KEYWORDS: Control systems, Electrodes, Semiconducting wafers, Photoresist materials, Diffusion, Photoresist processing, Chemically amplified resists, Scanning electron microscopy, Microfabrication, Real-time computing

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Showing 5 of 11 publications

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