Wen Chang Hsueh
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 9 September 2013 Paper
Wen-Chang Hsueh, Li-Chih Yeh, Ming-Jiun Yao, Yun-Yue Lin, Jia-Jen Chen, Shin-Chang Lee, Anthony Yen
Proceedings Volume 8880, 88800Y (2013) https://doi.org/10.1117/12.2025786
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Scanning electron microscopy, Semiconducting wafers, Extreme ultraviolet lithography, Atomic force microscopy, Fermium, Lithography, Frequency modulation

Proceedings Article | 7 April 2011 Paper
Proceedings Volume 7969, 79691D (2011) https://doi.org/10.1117/12.881583
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Etching, Extreme ultraviolet, Manufacturing, Deposition processes, Defect inspection, Chromium, Lithography

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