Formation of dark spatial optical solitons in planar waveguides produced by implantation of light ions into Fe- or Cudoped
X cut lithium niobate wafers is experimentally studied. The implantation both of protons and O3+-ions results in
the excellent waveguide layers with their thickness about 3 microns and optical losses less than 1 dB/cm. The soliton
states at light wavelengths of 532 nm and 633 nm are developed due to the self-defocusing photorefractive-photovoltaic
nonlinearity of lithium niobate. Extraordinarily polarized light beams are used in experiments to form dark solitons and
to probe the soliton-induced waveguide channels. Steady-state dark photovoltaic spatial solitons have been realized in
both, H+- implanted and O3+ - implanted planar waveguides at optical powers from 10 to 100 microwatts. The storage
time of soliton-induced channel waveguides makes up at least some hours without special illumination of a planar
waveguide and they may be erased within some seconds in a case of their permanent readout with stronger light beams.
The possibility to form more complicated channel waveguide structures in regimes of dark spatial solitons is also
demonstrated.
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