Tomoyuki Matsuyama
Department Manager at Nikon Corp
SPIE Involvement:
Author
Publications (56)

Proceedings Article | 20 March 2019 Paper
Proceedings Volume 10961, 109610M (2019) https://doi.org/10.1117/12.2514917
KEYWORDS: Calibration, Reticles, Actuators, Control systems, Wavefronts, Scanners, Distortion, Automatic control, Feedback control, Deformable mirrors

Proceedings Article | 18 March 2015 Paper
Zhengkai Yang, Wuping Wang, Quan Chen, Hajime Aoyama, Kengo Takemasa, Toshihiko Sei, Tami Miyazawa, Tomoyuki Matsuyama, Chun Shao
Proceedings Volume 9426, 942621 (2015) https://doi.org/10.1117/12.2086062
KEYWORDS: Optical simulations, Critical dimension metrology, Scanners, Lithography, Photomasks, Optical proximity correction, Performance modeling, Photoresist processing, Immersion lithography, Data modeling

Proceedings Article | 18 March 2015 Paper
Hirotaka Kono, Kazuo Masaki, Tomoyuki Matsuyama, Shinji Wakamoto, Seemoon Park, Taro Sugihara, Yuichi Shibazaki
Proceedings Volume 9426, 942619 (2015) https://doi.org/10.1117/12.2085689
KEYWORDS: Scanners, Metrology, Semiconducting wafers, Lithography, Calibration, Overlay metrology, Atrial fibrillation, Feedback loops, Yield improvement, Time metrology

Proceedings Article | 18 March 2015 Paper
Reiji Kanaya, Koichi Fujii, Motokatsu Imai, Tomoyuki Matsuyama, Takao Tsuzuki, Qun Ying Lin
Proceedings Volume 9426, 94261O (2015) https://doi.org/10.1117/12.2085606
KEYWORDS: 3D modeling, Photomasks, Wavefronts, Projection systems, Diffraction, Computer simulations, Finite-difference time-domain method, Optical lithography, Lithography, Lithographic illumination

Proceedings Article | 31 March 2014 Paper
Hisashi Nishinaga, Toru Hirayama, Daiyu Fujii, Hajime Yamamoto, Hiroshi Irihama, Taro Ogata, Yukio Koizumi, Kenta Suzuki, Yohei Fujishima, Tomoyuki Matsuyama, Ryoichi Kawaguchi
Proceedings Volume 9052, 90520B (2014) https://doi.org/10.1117/12.2046640
KEYWORDS: Reticles, Distortion, Control systems, Ions, Sensors, Image sensors, Optical scanning, Printing, Immersion lithography, Lithography

Proceedings Article | 31 March 2014 Paper
Hajime Aoyama, Toshiharu Nakashima, Taro Ogata, Shintaro Kudo, Naonori Kita, Junji Ikeda, Ryota Matsui, Hajime Yamamoto, Ayako Sukegawa, Katsushi Makino, Masayuki Murayama, Kazuo Masaki, Tomoyuki Matsuyama
Proceedings Volume 9052, 90520A (2014) https://doi.org/10.1117/12.2046547
KEYWORDS: Reticles, Photomasks, Scanners, Critical dimension metrology, Semiconducting wafers, Lithography, Electroluminescence, Error analysis, Distortion, Data modeling

SPIE Journal Paper | 2 December 2013 Open Access
Hirohiko Izumi, Keiichi Tajima, Joachim Siebert, Wolfgang Demmerle, Tomoyuki Matsuyama, Hajime Aoyama, Yasushi Mizuno, Noriyuki Hirayanagi, Naonori Kita, Ryota Matsui
JM3, Vol. 13, Issue 01, 011005, (December 2013) https://doi.org/10.1117/12.10.1117/1.JMM.13.1.011005
KEYWORDS: Source mask optimization, Scanners, Fiber optic illuminators, Critical dimension metrology, Photomasks, Optical proximity correction, Semiconducting wafers, SRAF, 3D modeling, Printing

Proceedings Article | 12 April 2013 Paper
Proceedings Volume 8683, 86830O (2013) https://doi.org/10.1117/12.2008267
KEYWORDS: Photomasks, Optimization (mathematics), Image processing, Freeform optics, Semiconducting wafers, Optical proximity correction, Source mask optimization, Cadmium sulfide, Detection and tracking algorithms, Optics manufacturing

Proceedings Article | 12 April 2013 Paper
Noriyuki Hirayanagi, Yasushi Mizuno, Masakazu Mori, Naonori Kita, Ryota Matsui, Tomoyuki Matsuyama
Proceedings Volume 8683, 86830D (2013) https://doi.org/10.1117/12.2011077
KEYWORDS: Modulation, Fiber optic illuminators, Distortion, Scanners, Photomasks, 3D modeling, Software development, Optimization (mathematics), Optical proximity correction, Lithography

Proceedings Article | 12 April 2013 Paper
Proceedings Volume 8683, 86830U (2013) https://doi.org/10.1117/12.2011691
KEYWORDS: Photomasks, Diffraction, Lithographic illumination, Ions, Neodymium, Semiconductors, Critical dimension metrology, Immersion lithography, Control systems, Lithography

Proceedings Article | 12 April 2013 Paper
Yohei Fujishima, Satoshi Ishiyama, Susumu Isago, Akihiro Fukui, Hajime Yamamoto, Toru Hirayama, Tomoyuki Matsuyama, Yasuhiro Ohmura
Proceedings Volume 8683, 86831I (2013) https://doi.org/10.1117/12.2010908
KEYWORDS: Distortion, Reticles, Lithography, Switching, Water, Semiconducting wafers, Imaging systems, Deformable mirrors, Lithographic lenses, Immersion lithography

Proceedings Article | 12 April 2013 Paper
Proceedings Volume 8683, 86831C (2013) https://doi.org/10.1117/12.2011613
KEYWORDS: Photomasks, Finite element methods, Fiber optic illuminators, Scanners, Near field, Maxwell's equations, Lithography, Image acquisition, Computational lithography, Computer simulations

Proceedings Article | 12 April 2013 Paper
Hajime Aoyama, Yasushi Mizuno, Noriyuki Hirayanagi, Naonori Kita, Ryota Matsui, Hirohiko Izumi, Keiichi Tajima, Joachim Siebert, Wolfgang Demmerle, Tomoyuki Matsuyama
Proceedings Volume 8683, 86830M (2013) https://doi.org/10.1117/12.2011353
KEYWORDS: Source mask optimization, Scanners, Optical proximity correction, Electroluminescence, Fiber optic illuminators, Photomasks, Critical dimension metrology, Semiconducting wafers, SRAF, Printing

Proceedings Article | 12 April 2013 Paper
Shinichi Mori, Hajime Aoyama, Taro Ogata, Ryota Matsui, Tomoyuki Matsuyama
Proceedings Volume 8683, 86830A (2013) https://doi.org/10.1117/12.2011382
KEYWORDS: Scanners, Metrology, Photomasks, Wavefronts, Image processing, Overlay metrology, Distortion, Reticles, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 13 March 2012 Paper
Proceedings Volume 8326, 83261B (2012) https://doi.org/10.1117/12.916957
KEYWORDS: Finite element methods, Photomasks, Near field, Fiber optic illuminators, Scanners, Stanford Linear Collider, Image acquisition, Lithography, Semiconducting wafers, Computer simulations

Proceedings Article | 13 March 2012 Paper
Tomoyuki Matsuyama, Taro Ogata, Yasushi Mizuno, Yasuhiro Ohmura
Proceedings Volume 8326, 83260N (2012) https://doi.org/10.1117/12.916588
KEYWORDS: Fiber optic illuminators, Source mask optimization, Modulation, Scanners, Point spread functions, Distortion, Semiconducting wafers, Photomasks, Imaging systems, Lithography

Proceedings Article | 13 March 2012 Paper
Tomoyuki Matsuyama, Naonori Kita, Ryota Matsui, Junji Ikeda
Proceedings Volume 8326, 83260K (2012) https://doi.org/10.1117/12.916594
KEYWORDS: Modulation, Fiber optic illuminators, Point spread functions, Optimization (mathematics), Distortion, Lithographic illumination, Source mask optimization, Scanners, Error analysis, Photomasks

Proceedings Article | 13 March 2012 Paper
Donis Flagello, Ryota Matsui, Kazuhiro Yano, Tomoyuki Matsuyama
Proceedings Volume 8326, 83260R (2012) https://doi.org/10.1117/12.917030
KEYWORDS: Photoresist materials, Calibration, Data modeling, Photoresist developing, Diffusion, Thin films, Statistical modeling, Image compression, Optical proximity correction, Finite element methods

Proceedings Article | 5 October 2011 Paper
Proceedings Volume 8171, 81710L (2011) https://doi.org/10.1117/12.899032
KEYWORDS: Modulation, Distortion, Fiber optic illuminators, Point spread functions, Source mask optimization, Lithographic illumination, Ray tracing, Lithography, Critical dimension metrology, Optical lithography

Proceedings Article | 20 May 2011 Paper
Hiroshi Watanabe, Kei Mesuda, Katsuya Hayano, Eiji Tsujimoto, Hideyoshi Takamizawa, Toshio Ohhashi, Naruo Sakasai, Shintaro Kudo, Tomoyuki Matsuyama
Proceedings Volume 8081, 808108 (2011) https://doi.org/10.1117/12.899910
KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Printing, Chromium, Etching, Resolution enhancement technologies, Source mask optimization, Binary data, Critical dimension metrology

Proceedings Article | 20 May 2011 Paper
Kei Mesuda, Hiroshi Watanabe, Katsuya Hayano, Eiji Tsujimoto, Hideyoshi Takamizawa, Toshio Ohhashi, Naruo Sakasai, Shintaro Kudo, Tomoyuki Matsuyama
Proceedings Volume 8081, 808102 (2011) https://doi.org/10.1117/12.899909
KEYWORDS: Lithography, Photomasks, Source mask optimization, SRAF, Resolution enhancement technologies, Head, Error analysis, Refractive index, Scanning electron microscopy, Lithographic illumination

Proceedings Article | 23 March 2011 Paper
Tomoyuki Matsuyama, Naonori Kita, Yasushi Mizuno
Proceedings Volume 7973, 79731H (2011) https://doi.org/10.1117/12.879395
KEYWORDS: Modulation, Distortion, Fiber optic illuminators, Source mask optimization, Immersion lithography, Imaging systems, Error analysis, Photomasks, Zernike polynomials, Wavefront analysis

Proceedings Article | 23 March 2011 Paper
Daniel Smith, Naonori Kita, Nobumichi Kanayamaya, Ryota Matsui, Shane Palmer, Tomoyuki Matsuyama, Donis Flagello
Proceedings Volume 7973, 797309 (2011) https://doi.org/10.1117/12.879116
KEYWORDS: Source mask optimization, Fiber optic illuminators, Point spread functions, Ray tracing, Lithographic illumination, Reticles, Critical dimension metrology, Lithography, Computer simulations, Imaging systems

Proceedings Article | 23 March 2011 Paper
Yasuhiro Ohmura, Taro Ogata, Toru Hirayama, Hisashi Nishinaga, Takeshi Shiota, Satoshi Ishiyama, Susumu Isago, Hidetaka Kawahara, Tomoyuki Matsuyama
Proceedings Volume 7973, 79730W (2011) https://doi.org/10.1117/12.879616
KEYWORDS: Wavefronts, Switching, Semiconducting wafers, Deformable mirrors, Polarization, Image processing, Glasses, Standards development, Critical dimension metrology, Monochromatic aberrations

Proceedings Article | 10 March 2010 Paper
Yasushi Mizuno, Tomoyuki Matsuyama, Soichi Owa, Osamu Tanitsu, Naonori Kita, Masahiko Okumura
Proceedings Volume 7640, 76401I (2010) https://doi.org/10.1117/12.846476
KEYWORDS: Fiber optic illuminators, Source mask optimization, Resolution enhancement technologies, Modulation, Lithographic illumination, Photomasks, Optical lithography, Zernike polynomials, Immersion lithography, Double patterning technology

Proceedings Article | 4 March 2010 Paper
Proceedings Volume 7640, 764007 (2010) https://doi.org/10.1117/12.846639
KEYWORDS: Modulation, Distortion, Source mask optimization, Tolerancing, Error analysis, Image processing, Optical lithography, Optical simulations, Fiber optic illuminators, Scanning electron microscopy

Proceedings Article | 4 March 2010 Paper
Jacek Tyminski, Tomoyuki Matsuyama, Yen-Liang Lu, Jun-Cheng Lai, Kao-Tun Chen, Yung-Ching Mai, Irene Su, George Bailey
Proceedings Volume 7640, 76400V (2010) https://doi.org/10.1117/12.845061
KEYWORDS: Optical proximity correction, Scanners, Photomasks, Fiber optic illuminators, Cadmium, Integrated circuits, Metrology, Tolerancing, Integrated optics, Diffraction

Proceedings Article | 10 December 2009 Paper
Proceedings Volume 7520, 75200C (2009) https://doi.org/10.1117/12.837161
KEYWORDS: Source mask optimization, Lithography, Photomasks, Metals, Optical lithography, Optical proximity correction, Lithographic illumination, Image transmission, Double patterning technology, Image processing

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 727408 (2009) https://doi.org/10.1117/12.813400
KEYWORDS: Source mask optimization, Resolution enhancement technologies, Imaging systems, Scanners, Optical lithography, Image processing, Photomasks, Optical proximity correction, Optical components, Lithography

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72740U (2009) https://doi.org/10.1117/12.810850
KEYWORDS: Scanners, Fiber optic illuminators, Data modeling, Optical proximity correction, Performance modeling, Optical imaging, Diffraction, Photomasks, Image acquisition, Lenses

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 72741M (2009) https://doi.org/10.1117/12.813399
KEYWORDS: Polarization, Wave plates, Polarizers, Glasses, Optical components, Polarization control, Wavefronts, Lenses, Matrices, Ray tracing

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 714013 (2008) https://doi.org/10.1117/12.804658
KEYWORDS: Imaging systems, Control systems, Wavefronts, Optical lithography, Double patterning technology, Optical proximity correction, Scanners, Metrology, Reticles, Lithography

Proceedings Article | 12 March 2008 Paper
Proceedings Volume 6924, 69241S (2008) https://doi.org/10.1117/12.771942
KEYWORDS: Imaging systems, Scanners, Optical proximity correction, Line width roughness, Control systems, Wavefronts, Optical lithography, Double patterning technology, Reticles, Metrology

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 692413 (2008) https://doi.org/10.1117/12.771622
KEYWORDS: Lithography, Surface finishing, Transparency, Immersion lithography, Refractive index, Polarization, Birefringence, Control systems, Point spread functions, Lens design

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69241V (2008) https://doi.org/10.1117/12.772586
KEYWORDS: Control systems, Monochromatic aberrations, Scanners, Photomasks, Semiconducting wafers, Wavefront aberrations, Manufacturing, Lithography, Artificial intelligence, Cadmium sulfide

Proceedings Article | 15 May 2007 Paper
Proceedings Volume 6607, 66071L (2007) https://doi.org/10.1117/12.728968
KEYWORDS: Optical proximity correction, Scanners, Fiber optic illuminators, Error analysis, Critical dimension metrology, Photomasks, Polarization, Electronic design automation, Optical lithography, Image acquisition

Proceedings Article | 26 March 2007 Paper
Proceedings Volume 6520, 652021 (2007) https://doi.org/10.1117/12.711340
KEYWORDS: Combined lens-mirror systems, Mirrors, Chromatic aberrations, Lens design, Wavefronts, Optical design, Refractive index, Surface roughness, Scanners, Deep ultraviolet

Proceedings Article | 26 March 2007 Paper
Yusaku Uehara, Tomoyuki Matsuyama, Toshiharu Nakashima, Yasuhiro Ohmura, Taro Ogata, Kosuke Suzuki, Noriaki Tokuda
Proceedings Volume 6520, 65202V (2007) https://doi.org/10.1117/12.711440
KEYWORDS: Monochromatic aberrations, Lithography, Lithographic illumination, Process control, Light sources, Resolution enhancement technologies, Optical lithography, Switching, Control systems, Phase shifts

Proceedings Article | 26 March 2007 Paper
Proceedings Volume 6520, 65200E (2007) https://doi.org/10.1117/12.711626
KEYWORDS: Scanners, Diffraction, Fiber optic illuminators, Optical lithography, Polarization, Manufacturing, Apodization, Solids, Cadmium sulfide, Image acquisition

Proceedings Article | 21 March 2007 Paper
Proceedings Volume 6521, 652116 (2007) https://doi.org/10.1117/12.711356
KEYWORDS: Optical proximity correction, Scanners, Apodization, Reticles, Polarization, Error analysis, Resolution enhancement technologies, Lithography, Lenses, SRAF

Proceedings Article | 21 July 2006 Paper
Tomoyuki Matsuyama, Tomoko Ujike
Proceedings Volume 6342, 63422D (2006) https://doi.org/10.1117/12.692226
KEYWORDS: Manufacturing, Optics manufacturing, Wavefront aberrations, Lens manufacturing, Wavefronts, Lithography, Zernike polynomials, Lens design, Monochromatic aberrations, Imaging technologies

Proceedings Article | 15 March 2006 Paper
Ken Ozawa, Boontarika Thunnakart, Tokihisa Kaneguchi, Isao Mita, Atsushi Someya, Toshiharu Nakashima, Hisashi Nishinaga, Yasushi Mizuno, Tomoyuki Matsuyama, Masato Hamatani
Proceedings Volume 6154, 61540C (2006) https://doi.org/10.1117/12.656242
KEYWORDS: Lithographic illumination, Lithography, Line edge roughness, SRAF, Polarization, Photomasks, Imaging devices, Optical proximity correction, Manufacturing, Logic

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 615421 (2006) https://doi.org/10.1117/12.656083
KEYWORDS: Polarization, Projection systems, Mirrors, Combined lens-mirror systems, Refractor telescopes, Monochromatic aberrations, Semiconducting wafers, Wafer-level optics, Wavefronts, Resolution enhancement technologies

Proceedings Article | 15 March 2006 Paper
Peter Dirksen, Joseph Braat, Augustus Janssen, Ad Leeuwestein, Tomoyuki Matsuyama, Tomoya Noda
Proceedings Volume 6154, 61540X (2006) https://doi.org/10.1117/12.659428
KEYWORDS: Reticles, Wavefronts, Spherical lenses, Monochromatic aberrations, Semiconducting wafers, Metrology, Interferometers, Mirrors, Objectives, Phase measurement

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 615403 (2006) https://doi.org/10.1117/12.656163
KEYWORDS: Lithography, Optical design, Lens design, Aspheric lenses, Kinematics, Lens manufacturing, Wavefronts, Metrology, Manufacturing, Glasses

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600331
KEYWORDS: Digital signal processing, Critical dimension metrology, Polarization, Zernike polynomials, Phase shifts, Scanners, Error analysis, Received signal strength, Immersion lithography, Refractive index

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.619863
KEYWORDS: Polarization, Digital signal processing, Critical dimension metrology, Imaging systems, Photomasks, Resolution enhancement technologies, Semiconducting wafers, Scanning electron microscopy, Line edge roughness, Metals

Proceedings Article | 28 May 2004 Paper
Tomoyuki Matsuyama, Toshiro Ishiyama, Yasuhiro Omura
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537206
KEYWORDS: Monochromatic aberrations, Optical design, Wavefronts, Lens manufacturing, Optics manufacturing, Deep ultraviolet, Scanners, Lithography, Distortion, Manufacturing

Proceedings Article | 26 June 2003 Paper
Tomoyuki Matsuyama, Issei Tanaka, Toshihiko Ozawa, Kazushi Nomura, Takashi Koyama
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485461
KEYWORDS: Wavefronts, Wavefront aberrations, Lens manufacturing, Critical dimension metrology, Manufacturing, Birefringence, Metrology, Interferometers, Lithography, Deep ultraviolet

Proceedings Article | 26 June 2003 Paper
Yasuo Shimizu, Tadashi Yamaguchi, Kousuke Suzuki, Yuji Shiba, Tomoyuki Matsuyama, Shigeru Hirukawa
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485459
KEYWORDS: Wavefronts, Imaging systems, Tolerancing, Device simulation, Silicon, Wavefront aberrations, Monochromatic aberrations, Distortion, Scanners, Manufacturing

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485462
KEYWORDS: Combined lens-mirror systems, Refractor telescopes, Projection systems, Mirrors, Chromatic aberrations, Optical components, Glasses, Calcium, Deep ultraviolet, Vacuum ultraviolet

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485465
KEYWORDS: Birefringence, Wavefront aberrations, Chromatic aberrations, Wavefronts, Surface finishing, Optical lithography, Lithography, Spatial frequencies, Projection systems, Optical components

Proceedings Article | 23 December 2002 Paper
Proceedings Volume 4832, (2002) https://doi.org/10.1117/12.486476
KEYWORDS: Deep ultraviolet, Scanners, Chemical elements, Lens design, Calcium, Birefringence, Aspheric lenses, Optical components, Kinematics, Optical design

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474617
KEYWORDS: Birefringence, Calcium, Kinematics, Imaging systems, Optical design, Chemical elements, Optical components, Deep ultraviolet, Scanners, Chromatic aberrations

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435753
KEYWORDS: Lens design, Semiconducting wafers, Distortion, Wavefront aberrations, Aspheric lenses, Scanners, Glasses, Optical design, Manufacturing, Reticles

Proceedings Article | 21 September 1998 Paper
Proceedings Volume 3482, (1998) https://doi.org/10.1117/12.322070
KEYWORDS: Lenses, Glasses, Lens design, Excimer lasers, Optical design, Refractive index, Laser systems engineering, Deep ultraviolet, Silica, Lithography

Showing 5 of 56 publications
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