Mr. Todd Embree Profile

Todd Embree

Senior Technologist at Sandia National Labs

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Publications (6)

Proceedings Article | 1 September 2015 Paper

A polarization system for persistent chemical detection

Julia Craven-Jones, Leah Appelhans, Eric Couphos, Todd Embree, Patrick Finnegan, Dennis Goldstein, David Karelitz, Charles LaCasse, Ting Luk, Adoum Mahamat, Lee Massey, Anthony Rynes, Cody Washburn, Steven Vigil

Proceedings Volume 9613, 96130B (2015) https://doi.org/10.1117/12.2188718

KEYWORDS: Polarization, Polarimetry, Signal to noise ratio, Prototyping, Sensors, Chemical analysis, Humidity, Chemical detection, Coating, Titanium dioxide

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Proceedings Article | 15 October 2012 Paper

Optical design and performance testing of an athermal SWIR gas correlation imager

A. Rynes, M. Smith, J. Mercier, S. Vigil, T. Embree, A. Ison

Proceedings Volume 8491, 84910B (2012) https://doi.org/10.1117/12.928001

KEYWORDS: Tolerancing, Sensors, Optical design, Silicon, Objectives, Imaging systems, Modulation transfer functions, Short wave infrared radiation, Optical alignment, Beam splitters

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Proceedings Article | 14 September 2001 Paper

Optical damage testing of materials for use in 157-nm photolithographic systems

Richard Morton, Todd Embree, Zsolt Bor, Chris Van Peski

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435648

KEYWORDS: Birefringence, Absorption, Calcium, Optical damage, Nitrogen, Wavefront distortions, Optical testing, Adaptive optics, Deep ultraviolet, Beam delivery

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Proceedings Article | 12 April 2001 Paper

Behavior of fused silica irradiated by a low-level 193-nm excimer laser for tens of billions of pulses

Chris Van Peski, Zsolt Bor, Todd Embree, Richard Morton

Proceedings Volume 4347, (2001) https://doi.org/10.1117/12.425033

KEYWORDS: Birefringence, Adaptive optics, Wavefront distortions, Silica, Absorption, Excimer lasers, Distortion, FT-IR spectroscopy, Manufacturing, Semiconductors

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Proceedings Article | 5 July 2000 Paper

Comparison of ArF and KrF laser performance at 2 kHz for microlithography

Herve Besaucele, Palash Das, Thomas Duffey, Todd Embree, Alexander Ershov, Vladimir Fleurov, Steven Grove, Paul Melcher, Richard Ness, Gunasiri Padmabandu

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388986

KEYWORDS: Optical lithography, Sensors, 193nm lithography, Pulsed power, Laser stabilization, Control systems, Laser applications, Optics manufacturing, Fabry–Perot interferometers, Optical components

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Proceedings Article | 29 June 1998 Paper

ArF lasers for production of semiconductor devices with CD<0.15 um

Thomas Duffey, Todd Embree, Toshihiko Ishihara, Richard Morton, William Partlo, Tom Watson, Richard Sandstrom

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310731

KEYWORDS: Lithography, Laser applications, Pulsed laser operation, Semiconductors, Excimer lasers, Laser stabilization, Optical damage, Semiconductor lasers, Diffraction gratings, Pulsed power

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Showing 5 of 6 publications

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