Dr. Srinivasan Chakrapani Profile

Dr. Srinivasan Chakrapani

Staff Scientist at EMD Electronics

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Publications (8)

Proceedings Article | 31 March 2010 Paper

Process optimization consideration for 193nm developable bottom anti-reflective coatings (DBARCs)

Takanori Kudo, Srinivasan Chakrapani, Alberto Dioses, Edward Ng, Charito Antonio, Deepa Parthasarathy, Richard Collett, Mark Neisser, Munirathna Padmanaban

Proceedings Volume 7639, 763928 (2010) https://doi.org/10.1117/12.846313

KEYWORDS: Fourier transforms, Lithography, Silicon, Plasma etching, Plasma, Coating, Polymers, Bottom antireflective coatings, Etching, 193nm lithography

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Proceedings Article | 11 December 2009 Paper

Latest developments in photosensitive developable bottom anti-reflective coating (DBARC)

Takanori Kudo, Srinivasan Chakrapani, Alberto Dioses, Edward Ng, Charito Antonio, Deepa Parthasarathy, Shinji Miyazaki, Yuki Ubayashi, Kazuma Yamamoto, Yasushi Akiyama, Richard Collett, Mark Neisser, Munirathna Padmanaban

Proceedings Volume 7520, 75200N (2009) https://doi.org/10.1117/12.837050

KEYWORDS: Fourier transforms, Polymers, Lithography, Bottom antireflective coatings, Plasma etching, Plasma, Etching, Silicon, Semiconducting wafers, Scanning electron microscopy

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Proceedings Article | 1 April 2009 Paper

Radiation sensitive developable bottom anti-reflective coatings (DBARC): recent results

Francis Houlihan, Alberto Dioses, Takanori Kudo, Meng Li, Lin Zhang, Sumathy Vasanthan, Srinivasan Chakrapani, Deepa Parthasarathy, Charito Antonio, Edward Ng, Ping-Hung Lu, Mark Neisser, Munirathna Padmanaban

Proceedings Volume 7273, 727316 (2009) https://doi.org/10.1117/12.816375

KEYWORDS: Prototyping, Polymers, Binary data, Fourier transforms, Bottom antireflective coatings, Arsenic, Plasma etching, Head-mounted displays, Electroluminescence, Coating

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Proceedings Article | 1 April 2009 Paper

Comparison of thermal flow and chemical shrink processes for 193 nm contact hole patterning

Takanori Kudo, Charito Antonio, John Sagan, Srinivasan Chakrapani, Deepa Parthasarathy, Sungeun Hong, Muthiah Thiyagarajan, Yi Cao, Munirathna Padmanaban

Proceedings Volume 7273, 72730X (2009) https://doi.org/10.1117/12.816633

KEYWORDS: Chemical reactions, Photoresist processing, Polymers, Semiconducting wafers, Industrial chemicals, Lithography, Optical lithography, Glasses, Resolution enhancement technologies, Fourier transforms

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Proceedings Article | 9 April 2007 Paper

Novel diamantane polymer platform for enhanced etch resistance

Munirathna Padmanaban, Srinivasan Chakrapani, Guanyang Lin, Takanori Kudo, Deepa Parthasarathy, Dalil Rahman, Clement Anyadiegwu, Charito Antonio, Ralph Dammel, Shenggao Liu, Frederick Lam, Anthony Waitz, Masao Yamagchi, Takayuki Maehara

Proceedings Volume 6519, 65190G (2007) https://doi.org/10.1117/12.713111

KEYWORDS: Polymers, Etching, Dry etching, Resistance, Lithography, Photoresist materials, 193nm lithography, Line width roughness, Molecules, Polymerization

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Proceedings Article | 6 April 2007 Paper

Some non-resist component contributions to LER and LWR in 193-nm lithography

Takanori Kudo, Srinivasan Chakrapani, Guanyang Lin, Clement Anyadiegwu, Charito Antonio, Deepa Parthasarathy, Ralph Dammel, Munirathna Padmanaban

Proceedings Volume 6519, 651941 (2007) https://doi.org/10.1117/12.713221

KEYWORDS: Line edge roughness, Nanoimprint lithography, Photomasks, Line width roughness, Fourier transforms, Binary data, Transmittance, Lithography, Polymers, Diffusion

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Proceedings Article | 11 April 2006 Paper

193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate

M. Dalil Rahman, Srivanisan Chakrapani, Clement Anyadiegwu, Guanyang Lin, Allen Timko, Frank Houlihan, David Rentkiewicz, Takanori Kudo, Douglas McKenzie, Ralph Dammel, Munirathna Padmanaban

Proceedings Volume 6153, 615327 (2006) https://doi.org/10.1117/12.658671

KEYWORDS: Polymers, Lithography, Line edge roughness, Semiconducting wafers, Photoresist processing, Critical dimension metrology, Polymer thin films, Etching, Lithographic illumination, Polymerization

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Proceedings Article | 11 April 2006 Paper

Performance of a dry 193nm resist under wet conditions

Munirathna Padmanaban, Andrew Romano, Guanyang Lin, Simon Chiu, Allen Timko, Frank Houlihan, Dalil Rahman, S. Chakrapani, T. Kudo, Ralph Dammel, Karen Turnquest, Georgia Rich, Scott Schuetter, Timothy Shedd, Gregory Nellis

Proceedings Volume 6153, 615307 (2006) https://doi.org/10.1117/12.659392

KEYWORDS: Thin film coatings, Lithography, Polymers, Line edge roughness, Semiconducting wafers, Photoresist processing, Line width roughness, Immersion lithography, Photoresist materials, Fourier transforms

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Showing 5 of 8 publications

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