Satoshi Yusa
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 30 September 2009 Paper
Proceedings Volume 7488, 74880T (2009) https://doi.org/10.1117/12.834581
KEYWORDS: Inspection, Nanoimprint lithography, Photomasks, Quartz, Vestigial sideband modulation, Defect inspection, Image processing, Manufacturing, Electronic components, Beam shaping

Proceedings Article | 27 May 2009 Paper
Proceedings Volume 7470, 74700J (2009) https://doi.org/10.1117/12.835181
KEYWORDS: Photomasks, Nanoimprint lithography, Vestigial sideband modulation, Ultraviolet radiation, Manufacturing, Optical lithography, Image processing, Transmission electron microscopy, Atomic force microscopy, Line edge roughness

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73792S (2009) https://doi.org/10.1117/12.824342
KEYWORDS: Vestigial sideband modulation, Nanoimprint lithography, Photomasks, Inspection, Scanning electron microscopy, Quartz, Line edge roughness, Manufacturing, Transmission electron microscopy, Beam shaping

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 72711M (2009) https://doi.org/10.1117/12.815467
KEYWORDS: Photomasks, Nanoimprint lithography, Vestigial sideband modulation, Manufacturing, Ultraviolet radiation, Optical lithography, Image processing, Transmission electron microscopy, Beam shaping, Atomic force microscopy

Proceedings Article | 20 October 2008 Paper
Shiho Sasaki, Takaaki Hiraka, Jun Mizuochi, Akiko Fujii, Yuko Sakai, Takanori Sutou, Satoshi Yusa, Koki Kuriyama, Masashi Sakaki, Yasutaka Morikawa, Hiroshi Mohri, Naoya Hayashi
Proceedings Volume 7122, 71223P (2008) https://doi.org/10.1117/12.802746
KEYWORDS: Photomasks, Vestigial sideband modulation, Nanoimprint lithography, Manufacturing, Ultraviolet radiation, Line edge roughness, Image processing, Optical lithography, Etching, Quartz

Showing 5 of 17 publications
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