CONFERENCE PROCEEDINGS
Advanced Search
Sangil Son
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 17 December 2024 Presentation + Paper
Sub-3nm gate-all-around process incoming control and application of advanced EUV overlay strategy enhancing productivity
Proceedings Volume PC12953, PC129530N (2024) https://doi.org/10.1117/12.3010035
KEYWORDS: Semiconducting wafers, Overlay metrology, Surface roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Process control, Lithography, Deformation, Optical alignment, Chemical vapor deposition
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top