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Sangil Son
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 10 April 2024 Presentation
Process incoming control for advanced EUV overlay strategy enabling mass production of GAA nanosheet
Proceedings Volume PC12953, PC129530N (2024) https://doi.org/10.1117/12.3010035
KEYWORDS: Extreme ultraviolet, Semiconducting wafers, Overlay metrology, Optical alignment, Logic, Process control, Modeling, Mathematical optimization
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