Dr. Ryosuke Kizu Profile

Dr. Ryosuke Kizu

at National Institute of Advanced Industrial Science and Technology

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Author

Publications (10)

Proceedings Article | 10 April 2024 Presentation

AFM observation of EUV photoresist shrinkage due to electron-beam exposure

Ryosuke Kizu, Kazuhiro Kumagai, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

Proceedings Volume 12955, 129551U (2024) https://doi.org/10.1117/12.3010107

KEYWORDS: Shrinkage, Photoresist materials, Extreme ultraviolet lithography, Atomic force microscopy

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SPIE Journal Paper | 7 December 2023

Evaluation of the change in photoresist sidewall roughness due to electron beam-induced shrinkage using atomic force microscopy

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

JM3, Vol. 22, Issue 04, 044002, (December 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.044002

KEYWORDS: Shrinkage, Photoresist materials, Line edge roughness, Scanning electron microscopy, Atomic force microscopy, 3D metrology, Lithography, Metrology, Fractal analysis, Electron beams

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Proceedings Article | 27 April 2023 Presentation + Paper

Photoresist shrinkage observation by a metrological tilting-AFM

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

Proceedings Volume 12496, 1249605 (2023) https://doi.org/10.1117/12.2655566

KEYWORDS: Shrinkage, Photoresist materials, Line edge roughness, Scanning electron microscopy, Atomic force microscopy, Metrology, Lithography, Deformation, Critical dimension metrology, 3D metrology

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Proceedings Article | 13 June 2022 Presentation

High-resolution sidewall observation and LER measurement of a photoresist pattern by a metrological tilting-AFM

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

Proceedings Volume PC12053, PC1205307 (2022) https://doi.org/10.1117/12.2614122

KEYWORDS: Photoresist materials, Line edge roughness, Metrology, Atomic force microscopy, Scanning electron microscopy, Lithography, Anisotropy, Silicon, 3D metrology, Reliability

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SPIE Journal Paper | 30 May 2022

Unbiased line edge roughness measurement using profile-averaging method for precise roughness parameters measurement

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

JM3, Vol. 21, Issue 02, 024001, (May 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.024001

KEYWORDS: Scanning electron microscopy, Line edge roughness, Metrology, Atomic force microscopy, Spatial resolution, Error analysis, Denoising, Silicon, Edge roughness, 3D metrology

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Proceedings Article | 22 February 2021 Presentation + Paper

Evaluating SEM-based LER metrology using a metrological tilting-AFM

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

Proceedings Volume 11611, 1161117 (2021) https://doi.org/10.1117/12.2583475

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SPIE Journal Paper | 23 October 2020 Open Access

Direct comparison of line edge roughness measurements by SEM and a metrological tilting-atomic force microscopy for reference metrology

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

JM3, Vol. 19, Issue 04, 044001, (October 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.4.044001

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SPIE Journal Paper | 23 March 2020 Open Access

Line edge roughness measurement on vertical sidewall for reference metrology using a metrological tilting atomic force microscope

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

JM3, Vol. 19, Issue 01, 014003, (March 2020) https://doi.org/10.1117/12.10.1117/1.JMM.19.1.014003

KEYWORDS: Line edge roughness, Metrology, Atomic force microscopy, Clouds, Scanning electron microscopy, Atomic force microscope, Servomechanisms, 3D metrology, Transmission electron microscopy, Semiconductors

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Proceedings Article | 20 March 2020 Presentation + Paper

Comparison of SEM and AFM performances for LER reference metrology

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

Proceedings Volume 11325, 113250Q (2020) https://doi.org/10.1117/12.2551468

KEYWORDS: Scanning electron microscopy, Line edge roughness, 3D metrology, Metrology, Spatial resolution, Edge roughness, Atomic force microscopy, 3D image processing, Error analysis, Lithography

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Proceedings Article | 26 March 2019 Paper

Accurate vertical sidewall measurement by a metrological tilting-AFM for reference metrology of line edge roughness

Ryosuke Kizu, Ichiko Misumi, Akiko Hirai, Satoshi Gonda

Proceedings Volume 10959, 109592B (2019) https://doi.org/10.1117/12.2511712

KEYWORDS: Line edge roughness, Metrology, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Surface roughness, Semiconductors, Lithography, Critical dimension metrology, Dimensional metrology

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Showing 5 of 10 publications

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