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Ryohei Gorai
at Toppan Printing Co Ltd
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Publications (2)
Proceedings Article | 1 December 2022 Paper
Novel high-k mask absorber for next generation EUV lithography
Hideaki Nakano, Ryohei Gorai, Yuto Yamagata, Daisuke Miyawaki, Kazunori Seki
Proceedings Volume 12292, 122920B (2022) https://doi.org/10.1117/12.2641289
KEYWORDS: Photomasks, Semiconducting wafers, Plasma, Extreme ultraviolet lithography, Hydrogen, Extreme ultraviolet, Optical lithography
Proceedings Article | 14 October 2011 Paper
Attenuated phase-shift mask with high tolerance for 193nm radiation damage
Taichi Yamazaki, Ryohei Gorai, Yosuke Kojima, Takashi Haraguchi, Tsuyoshi Tanaka, Ryuji Koitabashi, Yukio Inazuki, Hiroki Yoshikawa
Proceedings Volume 8166, 81663V (2011) https://doi.org/10.1117/12.898984
KEYWORDS: Photomasks, Silica, Lithography, Opacity, Excimer lasers, Phase shifts, Critical dimension metrology, Chemical vapor deposition, Radiation effects, 193nm lithography
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