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Ryo Ogawa
at KIOXIA Corp.
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Publications (1)
Proceedings Article | 13 June 2022 Presentation
Evaluation of alignment accuracy for nano-imprint lithography
Kazuya Fukuhara, Masaki Mitsuyasu, Ryo Ogawa, Katsuya Abe, Anupam Mitra, Sachiko Kobayashi, Satoshi Mitsugi, Motofumi Komori, Takuya Kono
Proceedings Volume PC12054, PC120540B (2022) https://doi.org/10.1117/12.2614407
KEYWORDS: Optical alignment, Semiconducting wafers, Nanoimprint lithography, Lithography, Semiconductor manufacturing, Semiconductors, Overlay metrology, Optical simulations, Manufacturing, Wafer-level optics
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