CONFERENCE PROCEEDINGS
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Dr. Pierre-Yves Thro
at CEA/Saclay
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 28 November 2013 Paper
Laser active thermography for non-destructive testing
A. Semerok, C. Grisolia, S. Fomichev, P.-Y. Thro
Proceedings Volume 9065, 90650A (2013) https://doi.org/10.1117/12.2053120
KEYWORDS: Pyrometry, Pulsed laser operation, Thermography, Phase shifts, Temperature metrology, Nondestructive evaluation, Optical simulations, Thermal modeling, Data modeling, Interfaces
Proceedings Article | 6 May 2005 Paper
Laser and optical developments of a modular laser-plasma source for EUV lithography
G. Cheymol, Ph. Cormont, D. Farcage, A. Montmerle-Bonnefois, P.-Y. Thro, J.-M. Weulersse, M. Schmidt, O. Sublemontier, B. Barthod, I. Gaurand, J. Skrzypczak
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.593285
KEYWORDS: Extreme ultraviolet, Laser development, Mirrors, Plasma, Control systems, Oscillators, Monochromatic aberrations, Laser optics, Laser systems engineering, EUV optics
Proceedings Article | 27 April 2005 Paper
Novel method to improve the performance of Nd:YAG high-power low-divergence lasers using a passive compensation of the spherical aberration inside the resonator
A. Montmerle Bonnefois, M. Gilbert, P.-Y. Thro, J.-M. Weulersse
Proceedings Volume 5707, (2005) https://doi.org/10.1117/12.592145
KEYWORDS: Monochromatic aberrations, Resonators, High power lasers, Thermal effects, Laser resonators, Nd:YAG lasers, Continuous wave operation, Beam shaping, Phase compensation, Lasers
Proceedings Article | 27 April 2005 Paper
Novel pump configuration for thin disk lasers
M. Gilbert, G. Cheymol, P.-Y. Thro, M. Pealat, G. Le Touze
Proceedings Volume 5707, (2005) https://doi.org/10.1117/12.592160
KEYWORDS: Disk lasers, Crystals, Doping, Ytterbium, Diodes, Finite element methods, Absorption, Optical components, Semiconductor lasers, Neodymium
Proceedings Article | 13 September 2002 Paper
PREUVE and the EXULITE project: modular laser-produced plasma EUV source
Tiberio Ceccotti, F. Chichmanian, D. Descamps, P. Haltebourg, Jean-Francois Hergott, S. Hulin, Didier Normand, Marc Segers, Olivier Sublemontier, Martin Schmidt, Philippe Cormont, M. Neu, Pierre-Yves Thro, Jean-Marc Weulersse, B. Barthod, R. Bernard, E. Veran, Jean-Marie Barbiche, Ph. D'Aux, E. Marquis
Proceedings Volume 4760, (2002) https://doi.org/10.1117/12.482115
KEYWORDS: Extreme ultraviolet, Xenon, Plasma, Extreme ultraviolet lithography, High power lasers, Laser development, Prototyping, Lithography, Laser systems engineering, Laser applications
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