Mr. Paul DePesa Profile

Paul DePesa

Retired

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Author

Publications (7)

Proceedings Article | 27 December 2002 Paper

Further developments in distributed hierarchical processing

Paul DePesa, Danny Keogan

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.469151

KEYWORDS: Computed tomography, Optical proximity correction, Operating systems, Databases, Data processing, Sun, Photomasks, Beam shaping, Analytical research, Beam analyzers

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Proceedings Article | 1 August 2002 Paper

Distributed hierarchical processing

Paul DePesa, Danny Keogan

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476932

KEYWORDS: Computed tomography, Databases, Photomasks, Optical proximity correction, Data processing, Resolution enhancement technologies, Beam shaping, Vestigial sideband modulation, Logic, Computer aided design

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Proceedings Article | 22 January 2001 Paper

Methods used to streamline data preparation for memory products

Paul DePesa, Wolfgang Leitermann

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410685

KEYWORDS: Computed tomography, Databases, Photomasks, Manufacturing, Windows NT, Sun, Optical proximity correction, Logic, Array processing, Photomask technology

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Proceedings Article | 22 January 2001 Paper

Using manufacturing rule check to prescreen reticle inspection databases

Charles Howard, Paul DePesa, Curt Linder

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410684

KEYWORDS: Inspection, Reticles, Manufacturing, Photomasks, Optical proximity correction, Databases, Computed tomography, Standards development, Binary data, Lithography

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Proceedings Article | 7 December 1994 Paper

Two-level masks for increased depth of focus

Rudolf von Buenau, Ricardo Diola, Paul DePesa, Stanney Kay, David Markle, Elizabeth Tai, Roger Fabian Pease

Proceedings Volume 2322, (1994) https://doi.org/10.1117/12.195837

KEYWORDS: Photomasks, Reflectivity, Photomask technology, Photoresist materials, Aluminum, Thin films, Head, Opacity, Solids, Lithography

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Proceedings Article | 15 February 1994 Paper

Fabrication and evaluation of a programmed transmission defect test mask

Larry Zurbrick, Paul DePesa, Ricardo Diola

Proceedings Volume 2087, (1994) https://doi.org/10.1117/12.167265

KEYWORDS: Photomasks, Defect detection, Semiconducting wafers, Reticles, Defect inspection, Inspection, Lithography, Chromium, Detection and tracking algorithms, Spectroscopy

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Proceedings Article | 1 January 1992 Paper

Automated critical dimension and registration communication

Paul DePesa, Todd Pegelow

Proceedings Volume 1604, (1992) https://doi.org/10.1117/12.56932

KEYWORDS: Photomasks, Manufacturing, Critical dimension metrology, Binary data, Telecommunications, Inspection, Computing systems, Data communications, Metrology, Software development

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Showing 5 of 7 publications

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