Mr. Pary Baluswamy Profile

Pary Baluswamy

Technology Transfer Manager

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 10 April 2013 Paper

Sub-40nm high-volume manufacturing overlay uncorrectable error evaluation

Pary Baluswamy, Ranjan Khurana, Bryan Orf, Wolfgang Keller

Proceedings Volume 8681, 868120 (2013) https://doi.org/10.1117/12.2012672

KEYWORDS: Semiconducting wafers, Data modeling, Statistical modeling, Overlay metrology, Statistical analysis, Error analysis, High volume manufacturing, Process control, Metrology, Feedback control

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Proceedings Article | 26 March 2007 Paper

Effects of reticle birefringence on 193-nm lithography

Scott Light, Irina Tsyba, Christopher Petz, Pary Baluswamy, Brett Rolfson

Proceedings Volume 6520, 65201K (2007) https://doi.org/10.1117/12.712251

KEYWORDS: Reticles, Critical dimension metrology, Semiconducting wafers, Line edge roughness, Polarization, Birefringence, Photomasks, Optical lithography, Cadmium, 193nm lithography

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Proceedings Article | 28 May 2004 Paper

Understanding focus in projection lithography systems

Pary Baluswamy, Hiroyuki Yamamoto, Zornitza Krasteva, Linda Somerville

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536028

KEYWORDS: Scanners, Projection lithography, Semiconducting wafers, Lithography, Sensors, Photomasks, Optical scanning systems, Photoresist processing, Refractive index, Binary data

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Proceedings Article | 28 May 2004 Paper

Process effects in flare measurement

Pary Baluswamy, Linda Somerville

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535474

KEYWORDS: Pellicles, Semiconducting wafers, Reflectivity, Thin films, Lenses, Scanners, Lithography, Light scattering, Image processing, Coating

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Proceedings Article | 26 June 2003 Paper

Practical resist model calibration

Pary Baluswamy, Amy Weatherly, Dave Kewley, Peter Brooker, Mike Pauzer

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485339

KEYWORDS: Calibration, Data modeling, Diffusion, Cadmium sulfide, Refractive index, Semiconducting wafers, Process modeling, Lithography, Monochromatic aberrations, Optimization (mathematics)

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Proceedings Article | 5 July 2000 Paper

Effect of lens aberrations on pattern placement error

Richard Holscher, Pary Baluswamy

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388966

KEYWORDS: Personal protective equipment, Diffractive optical elements, Zernike polynomials, Monochromatic aberrations, Metals, Lithographic illumination, Error analysis, Overlay metrology, Binary data, Photomasks

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Proceedings Article | 29 June 1998 Paper

Exposure effects on deep-ultraviolet resist thickness

Pary Baluswamy, Thomas Glass

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310815

KEYWORDS: Deep ultraviolet, Semiconducting wafers, Lithography, Chemically amplified resists, Chemistry, Surface roughness, Glasses, Semiconductors, Manufacturing, Refractive index

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