Directed self-assembly (DSA) of a block copolymer containing hybrid material using topographic guiding patterns is
presented in this paper. Lamellar microdomains of the hybrid material, which is a mixture of poly(styrene-b-ethylene
oxide) (PS-b-PEO) and organosilicate (OS) precursor, have orientational correlation length about five times longer than
typical organic block copolymers such as poly(styrene-b-methyl methacrylate) (PS-b-PMMA). The longer correlation
length (i.e. bigger grain size) makes it possible to align the lamellar microdomain into geometries similar to device
layouts. We report one-dimensional assembly of lamellar microdomains on substrates, which gives crossbar and multifinger
nanostructures.
Material properties and directed self-assembly of a block copolymer containing hybrid material are presented in this
paper. The hybrid material, which is a mixture of poly(styrene-b-ethylene oxide) (PS-b-PEO) and organosilicate (OS),
shows morphologies of microdomains similar to those of organic diblock copolymers depending on the fraction of each
phase, i.e. PS and PEO+OS. This material system shows very strong segregation between phases, which provides well
defined microdomains in thin films even right after spin coating. The strong segregation also makes it possible to
generate microdomains of sub-10 nm length scale regime. The hybrid is found to be directed self-assembly (DSA)-
friendly, thus typical topographic and/or chemical guiding patterns can be used for DSA of the hybrid.
We report the formation of robust organosilicate line patterns of ~20nm half-pitch on surfaces from the self-assembled
lamellar phase of a diblock copolymer of polystyrene and poly(ethylene oxide), PS-b-PEO, and an oligomeric
organosilicate precursor mixtures. We could control the orientation and alignment of microdomains of this hybrid to the
same degree of the thin films of organic block copolymers. By controlling the surface energy of substrates using dense
organosilicate, the perpendicular orientation of lamellae to the surface was achieved. Topographic prepatterns were
generated by E-beam lithography and used for alignment of the line patterns from lamellar phase. Upon removing the
organic component (i.e. PS-b-PEO) by thermal treatment, the organosilicate microdomains remain as periodic line
patterns with global alignment on surfaces. This method gives well-aligned silicon-containing line patterns with sublithographic
length scales on surface. The self-assembled organosilicate line patterns were successfully transferred into
underlying silicon substrate using anisotropic plasma etching.
We prepared a sol-gel hybrid material which has low loss near 1.5 μm wavelength using methyltriethoxysilane, vinyltriethoxysilane, and phenyltrimethoxysilane as precursors. Several erbium precursors were used in order to incorporate into the hybrid matrix. Among several Er-doped system, the sol-gel hybrid films doped with ErQ showed a clear photoluminescence at 1.5μm when they were pumped by 477nm light, not a resonant wavelength of Er3+ ions, which is expected to absorb the pump energy and transfer to adjacent Er3+ ions. Indirect excitation mechanism was investigated by photoluminescence excitation measurement using various wavelengths of Ar+ laser. The sol-gel hybrid films doped with ErQ show an efficient indirect excitation of Er3+ luminescence through ligand sensitization.
Sol-gel hybrid glass (SGHG) films doped with various photoinitiators were prepared. Volatile photoinitiators are photolocked in SGHG matrix by photochemical reaction upon UV exposure. Refractive index and film thickness increases by UV exposure due to photoinduced polymerization and photolocking of high refractive index species. Using the photolocking of photoinitiators, channel waveguide was fabricated without using developing process step, which will be called photochemical self-developing.
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