CONFERENCE PROCEEDINGS
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Osamu Wakimoto
Cooperate Officer at JEOL Ltd
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 25 May 2010 Paper
Monitor technology of outer circumstances for mask EB writing system
H. Hoshi, N. Samoto, H. Manabe, O. Wakimoto, S. Iida, M. Yamabe
Proceedings Volume 7748, 774817 (2010) https://doi.org/10.1117/12.864043
KEYWORDS: Photomasks, Diagnostics, System integration, Magnetism, Data processing, Inspection, Reliability, Electronics, Manufacturing, Environmental sensing
Proceedings Article | 3 April 2010 Paper
Monitor and self-diagnostic technology for mask e-beam writing system
N. Samoto, H. Manabe, O. Wakimoto, S. Iida, H. Hoshi, M. Yamabe
Proceedings Volume 7637, 76371K (2010) https://doi.org/10.1117/12.846266
KEYWORDS: Photomasks, Diagnostics, System integration, Amplifiers, Magnetism, Inspection, Data processing, Signal detection, Electronics, Error analysis
Proceedings Article | 11 May 2009 Paper
Improvement of data transfer speed and development of an EB data verification system in a VSB mask writer
Proceedings Volume 7379, 73791Z (2009) https://doi.org/10.1117/12.824312
KEYWORDS: Photomasks, Data processing, Lithography, Computing systems, Reliability, Data storage, Resolution enhancement technologies, Digital recording, Optical proximity correction, Control systems
Proceedings Article | 18 March 2009 Paper
Monitor and self-diagnostic technology for mask e-beam writing system
Norihiko Samoto, Hironobu Manabe, Osamu Wakimoto, Satoshi Iida, Hiromichi Hoshi, Masaki Yamabe
Proceedings Volume 7271, 72712R (2009) https://doi.org/10.1117/12.813360
KEYWORDS: Photomasks, Data processing, Amplifiers, Diagnostics, Inspection, Environmental monitoring, System integration, Signal detection, Reliability, Analog electronics
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