Dr. Nick I. Pellens
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 13 November 2024 Presentation
Proceedings Volume PC13215, PC132150A (2024) https://doi.org/10.1117/12.3038962
KEYWORDS: Scanners, Semiconducting wafers, Scanning electron microscopy, Photomasks, Overlay metrology, Optical proximity correction, Metrology, Image processing, Extreme ultraviolet lithography, EUV optics

Proceedings Article | 12 November 2024 Presentation + Paper
Proceedings Volume 13215, 1321505 (2024) https://doi.org/10.1117/12.3033432
KEYWORDS: Photomasks, Wavefronts, Logic, Source mask optimization, Extreme ultraviolet, Optical lithography, Light sources and illumination, Diffraction, Scanners

Proceedings Article | 18 September 2024 Paper
Proceedings Volume 13273, 132731M (2024) https://doi.org/10.1117/12.3031718
KEYWORDS: Source mask optimization, Metals, Printing, Nanoimprint lithography, Logic, Lithography, Extreme ultraviolet lithography, 3D mask effects, Extreme ultraviolet, Scanners

Proceedings Article | 26 August 2024 Paper
Proceedings Volume 13177, 131770O (2024) https://doi.org/10.1117/12.3032310
KEYWORDS: Lithography, Extreme ultraviolet, 3D mask effects, Simulations, Semiconducting wafers

Proceedings Article | 26 August 2024 Paper
Proceedings Volume 13177, 131770F (2024) https://doi.org/10.1117/12.3034393
KEYWORDS: Reflectivity, Optical proximity correction, Critical dimension metrology, Reflection, Light sources and illumination, Semiconducting wafers, Tantalum, Design, 3D mask effects, Scanners

Showing 5 of 7 publications
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