Mr. Mumit Khan Profile

Mumit Khan

at Univ of Wisconsin-Madison

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Author

Publications (14)

Proceedings Article | 20 May 2004 Paper

Modeling for sub-50-nm x-ray application with phase masks

James Taylor, Daniel Malueg, Franco Cerrina, Mumit Khan, Don Thielman

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535422

KEYWORDS: Photomasks, X-rays, Semiconducting wafers, Phase shifts, Silicon, Lithography, Wavefronts, Silicon carbide, Beam propagation method, Photoresist materials

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Proceedings Article | 20 August 2001 Paper

New results in high-energy proximity x-ray lithography

Mumit Khan, Geng Han, Juan Maldonado, Franco Cerrina

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436639

KEYWORDS: Photomasks, Photons, Electrons, Absorption, Diffraction, X-ray lithography, Diamond, Silicon, Printing, Semiconducting wafers

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Proceedings Article | 21 July 2000 Paper

Processing latitude study on x-ray phase-shifting masks

Lei Yang, Mumit Khan, James Taylor, Yuli Vladimirsky, Niru Dandekar

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390092

KEYWORDS: Photomasks, Phase shifts, X-rays, Phase shifting, X-ray lithography, Lithography, X-ray sources, Critical dimension metrology, Gold, Silicon carbide

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Proceedings Article | 25 June 1999 Paper

X-ray mask fabrication at CXrL

Quinn Leonard, Jaz Bansel, Lei Yang, Olga Vladimirsky, Srinivas Bollepalli, Mumit Khan, Yuli Vladimirsky, Franco Cerrina, James Taylor, Klaus Simon, Lynn Rathbun, Richard Tiberio

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351147

KEYWORDS: Photomasks, X-rays, Gold, Etching, X-ray lithography, Photoresist materials, Lithography, Silicon, Electron beam lithography, Scanning electron microscopy

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Proceedings Article | 8 June 1998 Paper

Parameter extraction with neural networks

Luca Cazzanti, Mumit Khan, Franco Cerrina

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308780

KEYWORDS: Neural networks, Process modeling, Computer simulations, Data modeling, Performance modeling, Image processing, Semiconductor manufacturing, Neurons, Solid modeling, Computer aided design

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In semiconductor processing, the modeling of the process is becoming more and more important. While the ultimate goal is that of developing a set of tools for designing a complete process (Technology CAD), it is also necessary to have modules to simulate the various technologies and, in particular, to optimize specific steps. This need is particularly acute in lithography, where the continuous decrease in CD forces the technologies to operate near their limits. In the development of a 'model' for a physical process, we face several levels of challenges. First, it is necessary to develop a 'physical model,' i.e. a rational description of the process itself on the basis of know physical laws. Second, we need an 'algorithmic model' to represent in a virtual environment the behavior of the 'physical model.' After a 'complete' model has been developed and verified, it becomes possible to do performance analysis. In many cases the input parameters are poorly known or not accessible directly to experiment. It would be extremely useful to obtain the values of these 'hidden' parameters from experimental results by comparing model to data. This is particularly severe, because the complexity and costs associated with semiconductor processing make a simple 'trial-and-error' approach infeasible and cost- inefficient. Even when computer models of the process already exists, obtaining data through simulations may be time consuming. Neural networks (NN) are powerful computational tools to predict the behavior of a system from an existing data set. They are able to adaptively 'learn' input/output mappings and to act as universal function approximators. In this paper we use artificial neural networks to build a mapping from the input parameters of the process to output parameters which are indicative of the performance of the process. Once the NN has been 'trained,' it is also possible to observe the process 'in reverse,' and to extract the values of the inputs which yield outputs with desired characteristics. Using this method, we can extract optimum values for the parameters and determine the process latitude very quickly.

Proceedings Article | 5 June 1998 Paper

Modeling study of image formation with point sources

Srinivas Bollepalli, Mumit Khan, Franco Cerrina

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309569

KEYWORDS: Image acquisition, Photomasks, Wave propagation, Convolution, Collimation, Image filtering, Semiconducting wafers, X-ray lithography, Nanolithography, Plasma

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Proceedings Article | 7 July 1997 Paper

X-ray phase mask: nanostructures

Zheng Chen, Quinn Leonard, Mumit Khan, Franco Cerrina

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275775

KEYWORDS: Photomasks, X-rays, X-ray lithography, Polymethylmethacrylate, Phase shifts, Semiconducting wafers, Nanostructures, Silicon carbide, Lithography, Silicon

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Proceedings Article | 7 July 1997 Paper

Simulation of x-ray mask defect printability

Srinivas Bollepalli, Scott Hector, Juan Maldonado, Jeffrey Leavey, Franco Cerrina, Mumit Khan

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275772

KEYWORDS: Photomasks, X-rays, Pellicles, Optical spheres, Software development, Polymethylmethacrylate, Diffraction, Mask making, Absorbance, Signal attenuation

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Proceedings Article | 7 July 1997 Paper

Topography description model for 3D exposure simulation

Mumit Khan, Srinivas Bollepalli, Franco Cerrina

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276038

KEYWORDS: 3D modeling, Photomasks, Time division multiplexing, Rule based systems, X-ray lithography, Phase shifting, Image acquisition, Wafer-level optics, Optical lithography, Semiconducting wafers

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Proceedings Article | 7 July 1997 Paper

Evaluation of aerial image in XRL

Moonsuk Yi, Ohyun Kim, Srinivas Bollepalli, Mumit Khan, Franco Cerrina

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275769

KEYWORDS: Image quality, Image processing, Photomasks, Lithography, X-ray lithography, Gold, Image analysis, Semiconducting wafers, X-rays, Image acquisition

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Proceedings Article | 13 May 1994 Paper

Spectral effects on x-ray lithography

Whitson Waldo, Azalia Krasnoperova, Mumit Khan, Cristiano Capasso, James Taylor, Franco Cerrina

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175798

KEYWORDS: Photomasks, Aluminum, Photons, Mirrors, X-ray lithography, Optical filters, Electrons, Absorption, Magnesium, Beryllium

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Proceedings Article | 13 May 1994 Paper

Comparative study of x-ray lithography process optimization using theoretical and empirical tools

Whitson Waldo, Cristiano Capasso, Azalia Krasnoperova, Mumit Khan, James Taylor, Franco Cerrina

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175833

KEYWORDS: Photomasks, X-ray lithography, Gold, Photoresist processing, Mirrors, Photoresist developing, Photoresist materials, Scanning electron microscopy, Image processing, Diffusion

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Proceedings Article | 9 July 1992 Paper

X-ray dose density: a new radiation damage modeling tool (Poster Paper)

F. Baszler, Mumit Khan, Franco Cerrina

Proceedings Volume 1671, (1992) https://doi.org/10.1117/12.136047

KEYWORDS: Oxides, X-rays, Etching, Silicon, Photomasks, Databases, Lithography, X-ray lithography, Transistors, Absorption

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Proceedings Article | 1 August 1991 Paper

EXCON: a graphics-based experiment-control manager

Mumit Khan, Paul Anderson, Franco Cerrina

Proceedings Volume 1465, (1991) https://doi.org/10.1117/12.47367

KEYWORDS: Systems modeling, Data modeling, Data conversion, X-ray lithography, Human-machine interfaces, X-rays, Manufacturing, Visualization, Data processing, Process modeling

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Showing 5 of 14 publications

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