Ms. Misako Saito Profile

Misako Saito

Group Leader at Tokyo Electron AT Ltd

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Author

Publications (4)

Proceedings Article | 4 December 2008 Paper

Electron beam charging of a SiO2 layer on Si: a comparison between Monte Carlo-simulated and experimental results

Kensuke Inai, Kaoru Ohya, Hideaki Kuwada, Ryosuke Kawasaki, Misako Saito, Kaoru Fujihara, Teruyuki Hayashi, Jack Jau, Kenichi Kanai

Proceedings Volume 7140, 71400X (2008) https://doi.org/10.1117/12.804461

KEYWORDS: Silica, Silicon, Selenium, Scanning electron microscopy, Monte Carlo methods, Defect inspection, Electron beams, Electron transport, Particles, Defect detection

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Proceedings Article | 16 April 2008 Paper

Study of ADI (After Develop Inspection) on photo resist wafers using electron beam (III): novel method for ADI on metal hard mask by penetration contrast

Teruyuki Hayashi, Misako Saito, Kaoru Fujihara, Jack Jau

Proceedings Volume 6922, 69223E (2008) https://doi.org/10.1117/12.771863

KEYWORDS: Defect detection, Defect inspection, Inspection, Scanning electron microscopy, Tin, Metals, Electron beams, Photomasks, Semiconducting wafers, Monte Carlo methods

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Proceedings Article | 5 April 2007 Paper

Study of ADI (After Develop Inspection) on photo resist wafers using electron beam (II)

Teruyuki Hayashi, Misako Saito, Kaoru Fujihara, Setsuko Shibuya, Y. Kudou, Hiroshi Nagaike, Joseph Lin, Jack Jau

Proceedings Volume 6518, 65184C (2007) https://doi.org/10.1117/12.711301

KEYWORDS: Defect inspection, Inspection, Inspection equipment, Critical dimension metrology, Etching, Semiconducting wafers, Resistance, FT-IR spectroscopy, Electron beams, Defect detection

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Proceedings Article | 24 March 2006 Paper

Study of ADI (after develop inspection) using electron beam

Misako Saito, Teruyuki Hayashi, Kaoru Fujihara, Kazuha Saito, Joseph Lin, Ryotaro Midorikawa

Proceedings Volume 6152, 615248 (2006) https://doi.org/10.1117/12.656090

KEYWORDS: Defect detection, Electron beams, Inspection, Defect inspection, Scanning electron microscopy, Monte Carlo methods, Photoresist processing, Manufacturing, Bridges, Resistance

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