Dr. Mauro Vasconi
Metrology and Support Manager at Numonyx Agrate
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 23 March 2009 Paper
Proceedings Volume 7272, 72720G (2009) https://doi.org/10.1117/12.814182
KEYWORDS: Overlay metrology, Double patterning technology, Semiconducting wafers, Diffraction, Scanners, Calibration, Metrology, Diffraction gratings, Spectroscopy, Polarizers

Proceedings Article | 22 March 2008 Paper
Proceedings Volume 6922, 69220O (2008) https://doi.org/10.1117/12.772516
KEYWORDS: Overlay metrology, Scatterometry, Semiconducting wafers, Diffraction, Chemical mechanical planarization, Silicon, Etching, Metrology, Scanners, Detection and tracking algorithms

Proceedings Article | 18 June 2007 Paper
Proceedings Volume 6616, 66160H (2007) https://doi.org/10.1117/12.725929
KEYWORDS: Overlay metrology, Scatterometry, Semiconducting wafers, Detection and tracking algorithms, Computer simulations, Silicon, Standards development, Electromagnetism, Metrology, Algorithms

Proceedings Article | 24 March 2006 Paper
Mauro Vasconi, Stephanie Kremer, M. Polli, Ermes Severgnini, Silvia Trovati
Proceedings Volume 6152, 61520D (2006) https://doi.org/10.1117/12.650997
KEYWORDS: Single crystal X-ray diffraction, Critical dimension metrology, Scatterometry, Silicon, Semiconducting wafers, Optical design, Reticles, Scanners, Optical testing, Etching

Proceedings Article | 15 March 2006 Paper
Alessandra Micheletti, Ermes Severgnini, Filippo Terragni, Mauro Vasconi
Proceedings Volume 6155, 61550J (2006) https://doi.org/10.1117/12.653037
KEYWORDS: Shape analysis, Semiconducting wafers, Optical lithography, Statistical analysis, Process control, Scanning electron microscopy, Electronic components, Edge detection, Control systems, Lithography

Proceedings Article | 10 May 2005 Paper
Pietro Cantu, Gianfranco Capetti, Chiara Catarisano, Fabrizio D'Angelo, Elena Evangelista, Ermes Severgnini, Silvia Trovati, Mauro Vasconi, Takumichi Sutani, Stephan Wahl, Robert Steffen
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601909
KEYWORDS: Computer aided design, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Image acquisition, Metrology, Critical dimension metrology, Instrument modeling, Detection and tracking algorithms, Visualization

Proceedings Article | 2 June 2003 Paper
Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.482645
KEYWORDS: Metrology, Line edge roughness, Scatterometry, Scanning electron microscopy, Semiconducting wafers, Reticles, Silicon, Coating, Critical dimension metrology, Edge roughness

Proceedings Article | 22 August 2001 Paper
Mauro Vasconi, Maddalena Bollin, Gina Cotti, Laurent Pain, Vincent Tirard
Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436791
KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Photoresist materials, Metrology, Electron beams, Target detection, Photoresist processing, Silicon, Ultraviolet radiation

Proceedings Article | 22 May 1995 Paper
Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209238
KEYWORDS: Process control, Metrology, Scanning electron microscopy, Etching, Cadmium, Visibility, Lithography, Metals, Semiconducting wafers, Oxides

Showing 5 of 9 publications
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