Dr. Martin C. Keck Profile

Dr. Martin C. Keck

Principal Resolution Enhancement Techniques at Qimonda AG

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Author

Publications (4)

Proceedings Article | 28 March 2007 Paper

Modular process modeling for OPC

M. Keck, C. Bodendorf, T. Schmidtling, R. Schlief, R. Wildfeuer, S. Zumpe, M. Niehoff

Proceedings Volume 6520, 652044 (2007) https://doi.org/10.1117/12.716295

KEYWORDS: Optical proximity correction, Process modeling, Data modeling, Photoresist processing, Etching, Error analysis, Scanning electron microscopy, 3D modeling, Wafer-level optics, Statistical modeling

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Proceedings Article | 28 June 2005 Paper

Simulation based OPC for contact pattern using 193 nm lithography

Martin Keck, Christof Bodendorf, Jorg Thiele, Alberto Gomez, Ying-Chung Tseng, Teng-Yen Huang

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617215

KEYWORDS: Optical proximity correction, Photomasks, Data modeling, Semiconducting wafers, Lithography, Printing, Scanning electron microscopy, Critical dimension metrology, Manufacturing, Phase shifts

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Proceedings Article | 17 December 2003 Paper

High-accuracy simulation-based optical proximity correction

Martin Keck, Thomas Henkel, Ralf Ziebold, Christian Crell, Jörg Thiele

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517462

KEYWORDS: Optical proximity correction, Data modeling, Photomasks, Scanning electron microscopy, Printing, Manufacturing, Semiconducting wafers, Critical dimension metrology, Lithography, Data processing

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Proceedings Article | 22 January 2001 Paper

Mask manufacturing rule check: how to save money in your mask shop

Martin Keck, Wolfram Ziegler, Roman Liebe, Torsten Franke, Gerd Ballhorn, Matthias Koefferlein, Joerg Thiele

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410681

KEYWORDS: Inspection, Photomasks, Manufacturing, Optical proximity correction, Inspection equipment, Computed tomography, Detection and tracking algorithms, Bridges, Tungsten, Silver

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