Dr. Linyong (Leo) Pang is currently the Chief Product Office and Executive Vice President at D2S, Inc.. Prior to D2S, Dr. Pang was the GM and sole Sr. Vice President of Luminescent Technologies. Dr. Pang joined the Luminescent executive team from its beginning in 2004 and played leadership roles with products, technologies, marketing, and customers until its final acquisition by KLA-Tencor. He is most widely known as the person that introduced curvilinear inverse lithography technology (ILT, which acronym he coined) to the lithography and photomask world. He founded and was the GM of the Computational Lithography division of Luminescent (acquired by Synopsys in 2012) as well as the Computational Metrology and Inspection division (acquired by KLA-Tencor in March 2014). His pioneering work in EDA and Semiconductor started back 2000, and as the inventor of the Numerical Technologies i-Virtual Stepper System, which was given the “2001 Editors' Choice Best Product Award” by Semiconductor International. Prior to joining Luminescent, Dr. Pang held several product development and marketing management positions at Numerical Technologies and Synopsys (after acquisition), and a research scientist position at Acuson. To date, Dr. Pang has 38 issued patents, 27 pending patents, and 85 publications. Dr. Pang received his Ph.D. in Mechanical Engineering and an additional M.S. in Computer Science from Stanford University.
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The new MDP methods may place shot edges slightly differently from target to compensate for mask process effects, so that the final patterns on a mask are much closer to the design (which can be viewed as the ideal mask), especially for those assist features. Such an alteration generally produces better masks that are closer to the intended mask design. Traditional XOR-based MDP verification cannot detect problems caused by eBeam effects. Much like model-based OPC verification which became a necessity for OPC a decade ago, we see the same trend in MDP today.
Simulation-based MDP verification solution requires a GPU-accelerated computational geometry engine with simulation capabilities. To have a meaningful simulation-based mask check, a good mask process model is needed. The TrueModel® system is a field tested physical mask model developed by D2S. The GPU-accelerated D2S Computational Design Platform (CDP) is used to run simulation-based mask check, as well as model-based MDP. In addition to simulation-based checks such as mask EPE or dose margin, geometry-based rules are also available to detect quality issues such as slivers or CD splits. Dose margin related hotspots can also be detected by setting a correct detection threshold.
In this paper, we will demonstrate GPU-acceleration for geometry processing, and give examples of mask check results and performance data. GPU-acceleration is necessary to make simulation-based mask MDP verification acceptable.
We reported capability of defect verification based on lithography simulation with a SEM system that architecture and software is excellent correlation for simple line and space.[1]
In this paper, we use a SEM system for the next generation combined with a lithography simulation tool for SMO-ILT, NTD and other complex pattern lithography. Furthermore we will use three dimension (3D) lithography simulation based on Multi Vision Metrology SEM system. Finally, we will confirm the performance of the 2D and 3D lithography simulation based on SEM system for a photomask verification.
Computational inspection applied to a mask inspection system with advanced aerial imaging capability
Computational inspection applied to a mask inspection system with advanced aerial imaging capability
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