Dr. Lifeng Duan Profile

Dr. Lifeng Duan

Product Director at Shanghai Micro Electronics Equipment Co Ltd

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Author

Publications (20)

SPIE Journal Paper | 24 January 2019

Predictor of thermal aberrations via particle filter for online compensation

Yanjie Mao, Sikun Li, Gang Sun, Lifeng Duan, Weijie Shi, Yang Bu, Xiangzhao Wang

JM3, Vol. 18, Issue 01, 013502, (January 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.013502

KEYWORDS: Particle filters, Filtering (signal processing), Thermal modeling, Particles, Semiconducting wafers, Projection systems, Lithography, Photomasks, Data modeling, Calibration

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SPIE Journal Paper | 11 April 2018

Modeling and optimization of lens heating effect for lithographic projector

Yanjie Mao, Sikun Li, Gang Sun, Lifeng Duan, Yang Bu, Xiangzhao Wang

JM3, Vol. 17, Issue 02, 023501, (April 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.2.023501

KEYWORDS: Projection systems, Lithography, Optical components, Optimization (mathematics), Thermal modeling, Refractive index, Photomasks, Optical design, Lithographic illumination, Thermography

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Proceedings Article | 20 March 2018 Paper

Prediction of lens heating induced aberration via particle filter in optical lithography

Yanjie Mao, Sikun Li, Gang Sun, Lifeng Duan, Weijie Shi, Yang Bu, Xiangzhao Wang

Proceedings Volume 10587, 105871K (2018) https://doi.org/10.1117/12.2297338

KEYWORDS: Particle filters, Semiconducting wafers, Lithography, Thermal modeling, Projection systems, Data modeling, Optical lithography, Manufacturing

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Proceedings Article | 24 March 2017 Paper

The thermal aberration analysis of a lithography projection lens

Yanjie Mao, Sikun Li, Gang Sun, Jian Wang, Lifeng Duan, Yang Bu, Xiangzhao Wang

Proceedings Volume 10147, 101471P (2017) https://doi.org/10.1117/12.2258037

KEYWORDS: Lens design, Thermal modeling, Lithography, Optical lithography, Refractive index, Optical design, Thermal analysis, Wavefront aberrations, Optical components, Silica, Photomasks

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SPIE Journal Paper | 13 November 2014

In situ aberration measurement method using a phase-shift ring mask

Sikun Li, Xiangzhao Wang, Jishuo Yang, Lifeng Duan, Feng Tang, Guanyong Yan

JM3, Vol. 14, Issue 01, 011005, (November 2014) https://doi.org/10.1117/12.10.1117/1.JMM.14.1.011005

KEYWORDS: Photomasks, In situ metrology, Process modeling, Image processing, Lithography, Principal component analysis, Error analysis, Image retrieval, Semiconducting wafers, Zernike polynomials

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SPIE Journal Paper | 11 June 2013

In situ aberration measurement technique based on an aerial image with an optimized source

Guanyong Yan, Xiangzhao Wang, Sikun Li, Jishuo Yang, Dongbo Xu, Lifeng Duan, Anatoly Bourov, Andreas Erdmann

OE, Vol. 52, Issue 06, 063602, (June 2013) https://doi.org/10.1117/12.10.1117/1.OE.52.6.063602

KEYWORDS: In situ metrology, Image processing, Principal component analysis, Process modeling, Lithography, Matrices, Optical engineering, Image retrieval, Lithographic illumination, Zernike polynomials

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SPIE Journal Paper | 7 May 2013

High-order aberration measurement technique based on a quadratic Zernike model with optimized source

Jishuo Yang, Xiangzhao Wang, Sikun Li, Lifeng Duan, Guanyong Yan, Dongbo Xu, Anatoly Bourov, Andreas Erdmann

OE, Vol. 52, Issue 05, 053603, (May 2013) https://doi.org/10.1117/12.10.1117/1.OE.52.5.053603

KEYWORDS: Photomasks, Lithography, Artificial intelligence, Principal component analysis, Optical engineering, Process modeling, Wavefront aberrations, Monochromatic aberrations, Instrument modeling, Mechanics

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Proceedings Article | 10 April 2013 Paper

Sensitivity improvement by a hybrid scatterometer

Hailiang Lu, Fan Wang, Lifeng Duan, Yonghui Chen

Proceedings Volume 8681, 86811M (2013) https://doi.org/10.1117/12.2011472

KEYWORDS: Colorimetry, Spectroscopy, Scatterometry, Microscopes, Polarization, CCD cameras, Metrology, Optical testing, Optical filters, Critical dimension metrology

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Proceedings Article | 18 December 2012 Paper

In situ aberration measurement technique based on quadratic Zernike model

Jishuo Yang, Xiangzhao Wang, Sikun Li, Lifeng Duan, Guanyong Yan, Dongbo Xu, Anatoly Bourov, Andreas Erdmann

Proceedings Volume 8550, 85503O (2012) https://doi.org/10.1117/12.981328

KEYWORDS: Lithography, Principal component analysis, Wavefront aberrations, In situ metrology, Semiconducting wafers, Image processing, Photomasks, Computer simulations, Metrology, Artificial intelligence

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Proceedings Article | 18 December 2012 Paper

In situ aberration measurement technique based on aerial image with optimized source

Guanyong Yan, Xiangzhao Wang, Sikun Li, Jishuo Yang, Dongbo Xu, Lifeng Duan, Anatoly Bourov, Andreas Erdmann

Proceedings Volume 8550, 85503N (2012) https://doi.org/10.1117/12.981334

KEYWORDS: Matrices, Lithographic illumination, Lithography, Image processing, Principal component analysis, Process modeling, Statistical analysis, Error analysis, Artificial intelligence, Imaging systems

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SPIE Journal Paper | 7 June 2012

Practical application of aerial image by principal component analysis to measure wavefront aberration of lithographic lens

Lifeng Duan, Xiangzhao Wang, Guanyong Yan, Anatoly Bourov

JM3, Vol. 11, Issue 02, 023009, (June 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.2.023009

KEYWORDS: Lithography, Principal component analysis, Sensors, Monochromatic aberrations, Wavefront aberrations, Image sensors, Semiconducting wafers, Image processing, Photomasks, Process modeling

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Proceedings Article | 5 April 2012 Paper

Improving the measurement performance of angle-resolved scattermetry by use of pupil optimization

Fan Wang, Qingyun Zhang, Hailiang Lu, Lifeng Duan, Xiaoping Li

Proceedings Volume 8324, 83242M (2012) https://doi.org/10.1117/12.916115

KEYWORDS: Scatterometry, Monte Carlo methods, Sensors, Critical dimension metrology, Process control, Target detection, Signal processing, Spatial light modulators, Lithography, Image sensors

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Proceedings Article | 13 March 2012 Paper

Symmetric polarization aberration compensation method based on scalar aberration control for lithographic projection lens

Yuanying Tu, Xiangzhao Wang, Sikun Li, Lifeng Duan, Peng Bu

Proceedings Volume 8326, 83262T (2012) https://doi.org/10.1117/12.917909

KEYWORDS: Polarization, Lithography, Photomasks, Matrices, Resolution enhancement technologies, Birefringence, Critical dimension metrology, Wave plates, Polarizers, Received signal strength

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Proceedings Article | 13 March 2012 Paper

The overlay performance optimization based on overlay manager system

G. Sun, J. Zhu, S. X. Li, F. L. Mao, L. F. Duan

Proceedings Volume 8326, 832625 (2012) https://doi.org/10.1117/12.916283

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Optical alignment, Source mask optimization, Data modeling, Control systems, Software development, Time metrology, Process control

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Proceedings Article | 13 March 2012 Paper

CDU prediction based on in-situ image measurements

A. Bourov, J. R. Cheng, L. Duan, J. Yang, J. Min

Proceedings Volume 8326, 83261T (2012) https://doi.org/10.1117/12.916629

KEYWORDS: Image sensors, Sensors, Semiconducting wafers, Image processing, Data modeling, Scanners, Deconvolution, Critical dimension metrology, Image acquisition, Photomasks

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Proceedings Article | 30 September 2011 Paper

Experimental determination of aberration in lithographic lens by aerial image

Lifeng Duan, Xiangzhao Wang, Guanyong Yan, Anatoly Bourov

Proceedings Volume 8169, 816909 (2011) https://doi.org/10.1117/12.896319

KEYWORDS: Lithography, Monochromatic aberrations, Sensors, Image sensors, Semiconducting wafers, Wavefront aberrations, Photomasks, Process modeling, Statistical analysis, Error analysis

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Proceedings Article | 20 April 2011 Paper

Multifeature focus exposure matrix for tool diagnosis

Zhiyong Yang, Anatoly Burov, Lifeng Duan, Fan Wang

Proceedings Volume 7971, 79712N (2011) https://doi.org/10.1117/12.879350

KEYWORDS: Semiconducting wafers, Error analysis, Lithography, Critical dimension metrology, Photomasks, Scanners, Diagnostics, Statistical analysis, Data processing, Finite element methods

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Proceedings Article | 23 March 2011 Paper

New 0.75 NA ArF scanning lithographic tool

Lifeng Duan, Jianrui Cheng, Gang Sun, Yonghui Chen

Proceedings Volume 7973, 79732D (2011) https://doi.org/10.1117/12.879376

KEYWORDS: Semiconducting wafers, Fiber optic illuminators, Reticles, Interferometers, Lithography, Overlay metrology, Scanners, Imaging systems, Mechanics, Projection systems

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Proceedings Article | 11 March 2010 Paper

Aerial image model and application to aberration measurement

Anatoly Bourov, Liang Li, Zhiyong Yang, Fan Wang, Lifeng Duan

Proceedings Volume 7640, 764032 (2010) https://doi.org/10.1117/12.848421

KEYWORDS: Sensors, Wavefronts, Image sensors, Image processing, Process modeling, Photomasks, Lithography, Semiconducting wafers, Image acquisition, Fiber optic illuminators

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Proceedings Article | 19 November 2007 Paper

Novel method for measuring axial aberrations of projection optics for lithographic tools

Mingying Ma, Fan Wang, Xiangzhao Wang

Proceedings Volume 6724, 67240N (2007) https://doi.org/10.1117/12.782572

KEYWORDS: Projection systems, Lithography, Semiconducting wafers, Lithographic illumination, Image quality, Optical lithography, Monochromatic aberrations, Finite element methods, Reticles, Critical dimension metrology

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Showing 5 of 20 publications

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