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Dr. Lihong Xiao
at Semiconductor Manufacturing International Corp
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Publications (1)
Proceedings Article | 8 March 2016 Paper
Study on overlay AEI-ADI shift on contact layer of advanced technology node
Guogui Deng, Jingan Hao, Lihong Xiao, Bin Xing, Yuntao Jiang, Kaiting He, Qiang Zhang, Weiming He, Chang Liu, Yi-Shih Lin, Qiang Wu, Xuelong Shi
Proceedings Volume 9778, 97782C (2016) https://doi.org/10.1117/12.2220013
KEYWORDS: Overlay metrology, Process control, Etching, Chemical vapor deposition, Semiconductors, Integrated circuits, Critical dimension metrology, Stress analysis, Semiconducting wafers, Photoresist materials, Lithography, Oxides, Optical lithography
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