Mr. Koji Hosono Profile

Koji Hosono

at Fujitsu Semiconductor Ltd

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Author

Publications (7)

Proceedings Article | 9 July 2015 Paper

CD measurement point extraction from local dense patterns

Masaaki Miyajima, Hiroyuki Matsumoto, Kanji Takeuchi, Mitsufumi Naoe, Koji Hosono, Toru Miyauchi

Proceedings Volume 9658, 96580Z (2015) https://doi.org/10.1117/12.2195445

KEYWORDS: Critical dimension metrology, Raster graphics, Photomasks, Control systems, Manufacturing, Scanners, Chromium, Environmental sensing, Measurement devices, Oxidation

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Proceedings Article | 4 March 2008 Paper

Global and local factors of on-chip variation of gate length

Morimi Osawa, Koji Hosono, Satoru Asai

Proceedings Volume 6925, 692508 (2008) https://doi.org/10.1117/12.772568

KEYWORDS: SRAF, Photomasks, Line width roughness, Critical dimension metrology, Electroluminescence, Cadmium, Lithography, Scanning electron microscopy, Transistors, Eye models

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Proceedings Article | 20 May 2006 Paper

Advanced process control of mask dry-etching using RF sensor

Hitoshi Handa, Satoshi Yamauchi, Koji Hosono, Hiroshi Maruyama, Daisuke Nakamura, Toshifumi Yokoyama, Akihiko Naito

Proceedings Volume 6283, 62830D (2006) https://doi.org/10.1117/12.681740

KEYWORDS: Etching, Chromium, Plasma, Sensors, Photomasks, Critical dimension metrology, Process control, Computer simulations, Oxygen, Phase shifts

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Proceedings Article | 27 December 2002 Paper

Preliminary study of 65-nm-node alternating phase-shift mask fabrication

Kouji Hosono, Naoyuki Ishiwata, Satoru Asai, Hiroshi Maruyama, Yutaka Miyahara, Syuichi Sanki, Youhei Yamashita, Yuichiro Hotta, Tomohiko Furukawa, Minoru Naitou, Hiroyuki Miyashita, Shigeru Noguchi

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467487

KEYWORDS: Chromium, Photoresist processing, Etching, Optical lithography, Quartz, Photomasks, Electron beam lithography, Error analysis, Overlay metrology, Lithography

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Proceedings Article | 22 January 2001 Paper

Investigations of CD variation in Cr dry etching process

Hitoshi Handa, Satoshi Yamauchi, Kouji Hosono, Hisatsugu Shirai

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410731

KEYWORDS: Etching, Chromium, Dry etching, Critical dimension metrology, Photoresist processing, Reticles, Wet etching, Chlorine gas, Magnetism, Reactive ion etching

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Proceedings Article | 30 December 1999 Paper

Dry etching technology of Cr films to produce fine-pattern reticles under 720 nm with ZEP-7000

Hitoshi Handa, Satoshi Yamauchi, Kouji Hosono, Yutaka Miyahara

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373299

KEYWORDS: Chromium, Etching, Dry etching, Reticles, Optical proximity correction, Photoresist processing, Binary data, Magnetism, Reactive ion etching, Tolerancing

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Proceedings Article | 1 September 1998 Paper

Deflection error due to charge-up effect of reticle substrate

Junji Hirumi, Tetsuya Hayashimoto, Toshiaki Kawabata, Kouji Hosono, Eiichi Hoshino, Junichi Kai

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328823

KEYWORDS: Electron beams, Reticles, Distortion, Photomasks, Coating, Optical alignment, Dielectrics, Electron beam lithography, Photoresist processing, Manufacturing

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Showing 5 of 7 publications

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