Mr. Jürgen Gramss Profile

Jürgen Gramss

at Vistec Electron Beam Lithography Group

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Author

Publications (14)

Proceedings Article | 2 April 2011 Paper

MSB for ILT masks

Juergen Gramss, Ulf Weidenmueller, Arnd Stoeckel, Renate Jaritz, Hans-Joachim Doering, Monika Boettcher

Proceedings Volume 7985, 798504 (2011) https://doi.org/10.1117/12.896883

KEYWORDS: Photomasks, Vestigial sideband modulation, Beam shaping, Lithography, Optical simulations, Logic devices, Optical proximity correction, Standards development, Statistical analysis, Scanning electron microscopy

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Proceedings Article | 25 September 2010 Paper

Multi-shaped e-beam technology for mask writing

Juergen Gramss, Arnd Stoeckel, Ulf Weidenmueller, Hans-Joachim Doering, Martin Bloecker, Martin Sczyrba, Michael Finken, Timo Wandel, Detlef Melzer

Proceedings Volume 7823, 782309 (2010) https://doi.org/10.1117/12.865708

KEYWORDS: Photomasks, Vestigial sideband modulation, Beam shaping, Metals, Lithography, Electron beam lithography, Optical proximity correction, Source mask optimization, Computational lithography, Integrated optics

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Proceedings Article | 23 September 2009 Paper

Latest results and computing performance of the ePLACE data preparation tool

J. Gramss, R. Galler, V. Neick, A. Stoeckel, U. Weidenmueller, D. Melzer, M. Suelzle, J. Butschke, U. Baetz

Proceedings Volume 7488, 748827 (2009) https://doi.org/10.1117/12.835880

KEYWORDS: Photomasks, Beam shaping, Data conversion, Magnesium, Electron beam lithography, Data processing, Visualization, Standards development, Lithography, Computer architecture

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Proceedings Article | 27 May 2009 Paper

A solution to meet new challenges on EBDW data prep

R. Galler, D. Melzer, J. Nowotny, K. Kroenert, M. Krueger, M. Suelzle, B. Papenfuss, C. Wagner, U. Baetz, B. Buerger, J. Gramss, M. Lemke

Proceedings Volume 7470, 74700S (2009) https://doi.org/10.1117/12.835190

KEYWORDS: Data processing, Computer simulations, Photomasks, Visualization, Electron beam direct write lithography, Lithography, Magnesium, Electron beams, Electron beam lithography, Algorithm development

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Proceedings Article | 3 May 2007 Paper

Data preparation for EBDW

Frank Thrum, Johannes Kretz, Tarek Lutz, Katja Keil, Christian Arndt, Kang-Hoon Choi, Ulrich Baetz, Nikola Belic, Melchior Lemke, Ulrich Denker, Juergen Gramss, Karl-Heinz Kliem

Proceedings Volume 6533, 65330K (2007) https://doi.org/10.1117/12.736976

KEYWORDS: Electron beam direct write lithography, Semiconducting wafers, Magnesium, Photomasks, Beam shaping, Electron beams, Optical lithography, Mask making, Vestigial sideband modulation, Lithography

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Proceedings Article | 3 May 2007 Paper

Electron beam direct write: shaped beam overcomes resolution concerns

Ines Stolberg, Laurent Pain, Johannes Kretz, Monika Boettcher, Hans-Joachim Doering, Juergen Gramss, Peter Hahmann

Proceedings Volume 6533, 65330J (2007) https://doi.org/10.1117/12.736974

KEYWORDS: Electron beam direct write lithography, Electron beams, Vestigial sideband modulation, Semiconductors, Prototyping, Manufacturing, Photomasks, Beam shaping, Electron beam lithography, Lithography

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Proceedings Article | 21 June 2006 Paper

Data prep: the bottleneck of future applications?

Juergen Gramss, Hans Eichhorn, Melchior Lempke, Renate Jaritz, Volker Neick, Dirk Beyer, Bertram Buerger, Ulrich Baetz, Klaus Kunze, Nikola Belic

Proceedings Volume 6281, 62810G (2006) https://doi.org/10.1117/12.692638

KEYWORDS: Data processing, Magnesium, Photomasks, Semiconducting wafers, Nanoimprint lithography, Lithography, Beam shaping, Human-machine interfaces, Operating systems, Computing systems

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Proceedings Article | 28 August 2003 Paper

Application results achieved with LINUX cluster for data preparation

Juergen Gramss, Melchior Lemke, Hans Eichhorn, Voler Neick, Michael Kramer, Erhard Stache

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504219

KEYWORDS: Vestigial sideband modulation, Data conversion, Mask making, Lithography

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Proceedings Article | 16 August 2002 Paper

Pattern data processing using 1-nm address grid

Juergen Gramss, Hans Eichhorn, Michael Gehre, Bernd Schnabel, Traugott Schulmeiss, Detlef Melzer, Klaus Kunze, Ulrich Baetz

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479333

KEYWORDS: Data processing, Photomasks, Data conversion, Data modeling, Beam shaping, Medium wave, Magnesium, Microsystems, Lithography, Infrared technology

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Proceedings Article | 9 April 2001 Paper

Electron-beam lithography data preparation based on multithreading MGS/PROXECCO

Hans Eichhorn, Melchior Lemke, Juergen Gramss, B. Buerger, Uwe Baetz, Nikola Belic, Hans Eisenmann

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425088

KEYWORDS: Magnesium, Computing systems, Data processing, Lithography, Sun, Photomasks, Optical proximity correction, Electron beam lithography, Data conversion, Clocks

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Proceedings Article | 3 February 2000 Paper

Advanced writing strategies for high-end mask making

Melchior Lemke, Juergen Gramss, Hans-Joachim Doering, Hans Eichhorn, Gerhard Schubert

Proceedings Volume 3996, (2000) https://doi.org/10.1117/12.377107

KEYWORDS: Photomasks, Mask making, Beam shaping, Lithography, Data processing, Magnesium, Microsystems, Image registration, Edge roughness, Vestigial sideband modulation

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Proceedings Article | 25 August 1999 Paper

Mask-writing system architecture and toolkit approach for 1G DRAM and beyond

Christian Ehrlich, Juergen Gramss, Hans-Joachim Doering

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360241

KEYWORDS: Photomasks, Lithography, Reticles, Electron beam lithography, Beam shaping, Manufacturing, Mask making, Metrology, Optical proximity correction, Semiconductors

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Proceedings Article | 1 September 1998 Paper

Large-glass reticle writer: exposure strategy and mask handling

Christian Ehrlich, Juergen Gramss

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328804

KEYWORDS: Photomasks, Reticles, Glasses, Semiconductors, Optical proximity correction, Mask making, Beam shaping, Raster graphics, Control systems, Lithography

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Proceedings Article | 27 May 1996 Paper

Fast layout data processing and repetitive structure exposure for high-throughput e-beam lithography

Juergen Gramss, Hans Eichhorn, Uwe Baetz

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240499

KEYWORDS: Data processing, Data storage, Magnesium, Electron beam lithography, Optical proximity correction, Microelectronics, Control systems, Semiconducting wafers, Picosecond phenomena, Sun

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Showing 5 of 14 publications

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