Dr. Jörg Mick
Graduate Engineer at temicon GmbH
SPIE Involvement:
Author
Area of Expertise:
interference lithography , nanostructures , optics , microstructures , seamless large area structuring , processes
Websites:
Profile Summary

Expertise in seamless large area micro- and nanostructuring on large areas in photoresists. Additional experience in tooling, e.g. metallic (nickel) tools, PDMS or polyermic molds for replication purposes. Such molds might be used for high volume mass replication processes like UV-roll-to-roll embossing, hot-embossing, injection molding, etc. Besides interference lithography, other tooling technologies like UV-lithography, diamond cutting, e-beam structuring, ... are well known.
Publications (6)

Proceedings Article | 19 June 2024 Presentation
Benedikt Bläsi, Martin Mattenheimer, Andreas Wessels, Oliver Höhn, Hubert Hauser, Jörg Mick, Thomas Kroyer
Proceedings Volume PC13014, PC1301407 (2024) https://doi.org/10.1117/12.3022111
KEYWORDS: Solar cells, Color, Tolerancing, Polymers, Polymer thin films, Photovoltaics, Multilayers, Interfaces, Glasses, Coating

Proceedings Article | 20 February 2017 Paper
Jörg Mick, Volkmar Boerner, Christoph Stöver, Thomas Ruhl, Philip Mück, Oliver Humbach
Proceedings Volume 10115, 101150U (2017) https://doi.org/10.1117/12.2252831
KEYWORDS: Lithography, Nanostructures, Nanolithography, Light sources and illumination, Life sciences, Nickel, Photoresist materials, Diffusers, Diffraction gratings, Nanostructuring, Control systems, Diffusion, Polymers

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598482
KEYWORDS: Photoresist materials, Lithography, Polymers, Silicon, Glasses, Optical components, Lenses, Photomicroscopy, Solar energy systems, Optics manufacturing

SPIE Journal Paper | 1 November 2004
Andreas Gombert, Benedikt Bläsi, Chiristopher Bühler, Peter Nitz, Jörg Mick, Wolfgang Hoßfeld, Michael Niggemann
OE, Vol. 43, Issue 11, (November 2004) https://doi.org/10.1117/12.10.1117/1.1803552
KEYWORDS: Antireflective coatings, Photoresist materials, Optics manufacturing, Lithography, Compound parabolic concentrators, Sun, Refractive index, Diffusers, Solar cells, Polymers

Proceedings Article | 8 September 2004 Paper
Andreas Gombert, Karen Forberich, Benedikt Blasi, Jorg Mick, Wolfgang HoBfeld, Volker Kubler, Volkmar Boerner
Proceedings Volume 5454, (2004) https://doi.org/10.1117/12.545637
KEYWORDS: Photoresist materials, Lithography, Nickel, Polymers, Ultraviolet radiation, Coating, Photoresist developing, Manufacturing, Optical properties, Transmittance

Showing 5 of 6 publications
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