Dr. Joel Seligson Profile

Dr. Joel Seligson

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Publications (10)

Proceedings Article | 14 March 2008 Paper

Diffraction order control in overlay metrology: a review of the roadmap options

Mike Adel, Daniel Kandel, Vladimir Levinski, Joel Seligson, Alex Kuniavsky

Proceedings Volume 6922, 692202 (2008) https://doi.org/10.1117/12.773243

KEYWORDS: Scatterometry, Overlay metrology, Metrology, Diffraction, Imaging systems, Detection and tracking algorithms, Spectroscopy, Optical lithography, Sensors, Image processing

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Proceedings Article | 10 May 2005 Paper

Overlay mark performance: a simulation study

Aviv Frommer, Joel Seligson

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599059

KEYWORDS: Overlay metrology, Signal processing, Photoresist processing, Semiconducting wafers, Device simulation, Optical design, Computer simulations, MATLAB, Image processing, Performance modeling

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Proceedings Article | 24 May 2004 Paper

Target noise in overlay metrology

Joel Seligson, Mike Adel, Pavel Izikson, Vladimir Levinski, Dan Yaffe

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534515

KEYWORDS: Overlay metrology, Aluminum, Reticles, Scanners, Metrology, Back end of line, Metals, Semiconducting wafers, Copper, Diagnostics

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Proceedings Article | 2 June 2003 Paper

Overlay metrology simulations: analytical and experimental validations

Joel Seligson, Boris Golovanevsky, Jorge Poplawski, Michael Adel, Richard Silver

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483661

KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Monte Carlo methods, Silicon, Diffraction, Wafer-level optics, Standards development, Electromagnetism, Optical testing

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Proceedings Article | 16 July 2002 Paper

Overlay accuracy: a metal layer study

Andrew Habermas, Bradley Ferguson, Joel Seligson, Elyakim Kassel, Pavel Izikson

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473466

KEYWORDS: Etching, Metals, Semiconducting wafers, Overlay metrology, Atomic force microscopy, Diffractive optical elements, Manufacturing, Metrology, Chemical mechanical planarization, Tolerancing

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Proceedings Article | 16 July 2002 Paper

TIS-WIS interaction characterization on overlay measurement tool

Kenji Hoshi, Eiichi Kawamura, Hiroshi Morohoshi, Hideki Ina, Takanori Fujimura, Hiroyuki Kurita, Joel Seligson

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473514

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Monochromatic aberrations, Chemical mechanical planarization, Optical alignment, Wafer-level optics, Tungsten, Metals, Silicon

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Proceedings Article | 16 July 2002 Paper

Overlay accuracy in 0.18-micron copper dual-damascene process

Bernd Schulz, Harry Levinson, Rolf Seltmann, Joel Seligson, Pavel Izikson, Anat Ronen

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473477

KEYWORDS: Overlay metrology, Semiconducting wafers, Calibration, Wafer-level optics, Etching, Optical testing, Metrology, Reticles, Scanners, Manufacturing

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Proceedings Article | 16 July 2002 Paper

Overlay metrology simulations

Joel Seligson, Michael Friedmann, Boris Golovanevsky, Vladimir Levinsky

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473469

KEYWORDS: Overlay metrology, Computer simulations, Metrology, Monochromatic aberrations, Detection and tracking algorithms, Photomasks, Polarization, Silicon, Near field, Semiconductors

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Proceedings Article | 2 June 2000 Paper

Manufacturing considerations for implementation of scatterometry for process monitoring

John Allgair, David Benoit, Robert Hershey, Lloyd Litt, Ibrahim Abdulhalim, William Braymer, Michael Faeyrman, John Robinson, Umar Whitney, Yiping Xu, Piotr Zalicki, Joel Seligson

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386465

KEYWORDS: Scatterometry, Reflectivity, Scanning electron microscopy, Critical dimension metrology, Metrology, Silicon, Atomic force microscopy, Manufacturing, Process control, Semiconducting wafers

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Proceedings Article | 4 August 1993 Paper

Phase image metrology with a modified coherence probe microscope

Diana Nyyssonen, Joel Seligson, Isaac Mazor

Proceedings Volume 1926, (1993) https://doi.org/10.1117/12.149020

KEYWORDS: Phase imaging, Microscopes, Coherence (optics), Oxides, Metrology, Semiconducting wafers, Image resolution, Phase measurement, Distortion, Computer simulations

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Showing 5 of 10 publications

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