Dr. Jianyong Ma Profile

Dr. Jianyong Ma

at Shanghai Institute of Optics and Fine Mechanics

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Publications (6)

Proceedings Article | 31 October 2016 Paper

Three-dimensional edge extraction in optical scanning holography

Yonghong Zong, Changhe Zhou, Jianyong Ma, Wei Jia, Jin Wang

Proceedings Volume 10022, 1002208 (2016) https://doi.org/10.1117/12.2245838

KEYWORDS: Spiral phase plates, 3D image processing, Holography, Optical scanning, 3D scanning, Image processing, Heterodyning, Holograms, 3D image reconstruction, Computer simulations

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Proceedings Article | 31 October 2016 Paper

Design and analysis of highly efficient reflective 1×3 splitting grating with triangular structure

Jin Wang, Changhe Zhou, Jianyong Ma, Yonghong Zong, Yancong Lu, Wei Jia

Proceedings Volume 10022, 1002215 (2016) https://doi.org/10.1117/12.2245837

KEYWORDS: Reflectivity, Error analysis, Optical design, Optical components, High power lasers, Tolerancing, Diffraction gratings, Diffraction, Beam splitters, Algorithms

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Proceedings Article | 11 November 2014 Paper

High divergent 2D grating

Jin Wang, Jianyong Ma, Changhe Zhou

Proceedings Volume 9271, 92711E (2014) https://doi.org/10.1117/12.2071324

KEYWORDS: Diffraction gratings, Diffraction, Etching, Multiphoton lithography, Optical design, Beam splitters, Microscopes, Objectives, Algorithms, Manufacturing

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Proceedings Article | 11 November 2014 Paper

Design and applications of digital diffractive gratings

Changhe Zhou, Jianyong Ma, Jin Wang, Junjie Yu, Wei Jia, Hongchao Cao, Jun Wu

Proceedings Volume 9271, 92711A (2014) https://doi.org/10.1117/12.2071429

KEYWORDS: Reflectivity, High power lasers, Laser drilling, Laser systems engineering, Optical design, Laser welding, Beam splitters, Fourier transforms, Laser applications, Electrons

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Proceedings Article | 26 November 2012 Paper

Calibration and pre-compensation of direct laser writing system

Feng Zhu, Changhe Zhou, Jianyong Ma

Proceedings Volume 8556, 855612 (2012) https://doi.org/10.1117/12.999423

KEYWORDS: Objectives, Microscopes, Ferroelectric materials, Actuators, Multiphoton lithography, Sensors, Calibration, Laser systems engineering, Lithography, Chromatic aberrations

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Proceedings Article | 17 November 2010 Paper

Application to the design of guide-mode resonance grating filter with using simulated annealing method

Jianyong Ma, Yon tao Fan, Changhe Zhou, Shaoqing Wang, Hongchao Cao

Proceedings Volume 7848, 784818 (2010) https://doi.org/10.1117/12.870147

KEYWORDS: Optical filters, Optical design, Reflection, Waveguides, Refractive index, Diffraction, Diffraction gratings, Algorithms, Optimization (mathematics), Reflectivity

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Although there are several well -known methods such as RCWA, FMM, for analyzing the diffraction properties of gratings, design of these optical elements with specified spectral properties is commonly a challenging problem. It is relatively not easy for the researchers to design narrow line-with diffraction filters based on guided mode resonance phenomenon with common diffraction algorithm. Simulated Annealing (SA) method is evolutionary, robust technique that has been widely utilized to design optical diffraction components. This method is inspired by the physical process of heating and controlled cooling of metal material to increase the size of its crystals and reduce their defects. The most distinctive features of this method lie in its powerful ability of convergence towards the global minimum in a reasonable computation time and the independence of the initial parameter values. In this paper, first, the physical basis of SA and its mathematical realization are introduced. Then, a Guided-Mode Resonant Grating (GMRG) filters with single layer is designed by using SA algorithm. The central wavelength of GMRG filter is locked at 532nm and its line-width is fixed at 1nm. The plane wave light radiates the grating from air cover with normal incidence. The optimized parameters are refractive indices and thicknesses of high and low material of grating, other parameters are grating period and fill factor of the grating. It is shown from our calculation that an excellent reflection spectrum with narrow line-width, high peak and low sideband can be obtained after optimizing the grating parameters. Next, a double layered GMRG filter with line-width of 4nm, which is relatively easy fabrication in experiment, is designed at central wavelength of 1064nm. The optimized parameters are grating period, groove depth, refractive index of waveguide layer and fill factor respectively. The grating substrate and waveguide layer are Sio2 and Hfo2 respectively, the grating structure is directly etched on the waveguide layer. The above grating values should be included in reasonable ranges in consideration of grating fabrication in our experiment condition. It is demonstrated from the calculations with the parameters obtained from SA optimization algorithm that the peak diffraction efficiency is more than 99% at central wavelength 1064nm and the sideband reflection is depressed at the level bellow 5% in a large wavelength range. Moreover, the parameters of a triple layer GMRG filter structure are also provided with this powerful method. Meanwhile, the results found by SA method are compared with RCWA theory.

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