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Ji-young Lee
at SAMSUNG Electronics Co Ltd
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Publications (1)
Proceedings Article | 14 May 2004 Paper
Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100 nm device performance
Ji-Young Lee, Jangho Shin, Hyun-Woo Kim, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han, Joo-Tae Moon
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534926
KEYWORDS: Line width roughness, Line edge roughness, Transistors, Critical dimension metrology, Etching, Photoresist materials, Semiconducting wafers, Lithography, Spatial frequencies, Failure analysis
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