Mr. Jeong-Seok Mun Profile

Jeong-Seok Mun

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Publications (1)

Proceedings Article | 25 March 2019 Presentation + Paper

Imaging behavior of highly fluorinated molecular resists under extreme UV radiation

Hyuntaek Oh, Seok-Heon Jung, Jeong-Seok Mun, Kanghyun Kim, Sangsul Lee, Jin-Kyun Lee

Proceedings Volume 10960, 1096012 (2019) https://doi.org/10.1117/12.2514928

KEYWORDS: Electron beam lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Polymers, Thin films, Silicon, Lithography, Ultraviolet radiation, Molecules, Photons

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