Dr. Jan-Peter Urbach Profile

Dr. Jan-Peter Urbach

at Optics Balzers AG

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Author

Publications (9)

Proceedings Article | 20 August 2004 Paper

Actinic aerial image measurement for qualification of defect on 157-nm photomask

Takashi Yasui, Iwao Higashikawa, Peter Kuschnerus, Wolfgang Degel, Klaus Boehm, Axel Zibold, Yuji Kobiyama, Jan-Peter Urbach, Christof Schilz, Silvio Teuber Semmler

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557762

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Semiconductors, Metrology, Wafer-level optics, Image quality, Lithographic illumination, CCD cameras, Binary data

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Proceedings Article | 28 May 2004 Paper

First results from AIMS beta tool for 157-nm lithography

Silvio Teuber, Iwao Higashikawa, Jan-Peter Urbach, Christof Schilz, Roderick Koehle, Axel Zibold

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536670

KEYWORDS: Photomasks, Phase shifts, Semiconducting wafers, Optical resolution, Lithography, Etching, Binary data, Wafer-level optics, CCD image sensors, Optical simulations

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Proceedings Article | 17 December 2003 Paper

EUV substrate and blank inspection with confocal microscopy

Jan-Peter Urbach, Jan Cavelaars, Hal Kusunose, Ted Liang, Alan Stivers

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518388

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Quartz, Confocal microscopy, Scattering, Particles, Signal detection, Extreme ultraviolet

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Proceedings Article | 28 August 2003 Paper

Actinic aerial image measurement tool for 157-nm mask qualification

Takashi Yasui, Iwao Higashikawa, Peter Kuschnerus, Thomas Engel, Axel Zibold, Claudia Hertfelder, Yuji Kobiyama, Jan-Peter Urbach, Christof Schilz, Armin Semmler

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504215

KEYWORDS: Photomasks, Binary data, CCD image sensors, CCD cameras, Image quality, Semiconducting wafers, Vacuum ultraviolet, Lithography, Vibration control, Optical resolution

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Proceedings Article | 28 May 2003 Paper

Performance of the aerial image measurement system for 157-nm lithography

Peter Kuschnerus, Thomas Engel, Wolfgang Harnisch, Claudia Hertfelder, Axel Zibold, Jan-Peter Urbach, Christof Schilz, Klaus Eisner

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.514958

KEYWORDS: Photomasks, Lithography, Lithographic illumination, Vacuum ultraviolet, Charge-coupled devices, CCD image sensors, Binary data, Reticles, Image quality, CCD cameras

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Proceedings Article | 27 December 2002 Paper

Aerial-image microscopes for the inspection of defects in EUV masks

Anton Barty, John Taylor, Russell Hudyma, Eberhard Spiller, Donald Sweeney, Gilbert Shelden, Jan-Peter Urbach

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467918

KEYWORDS: Imaging systems, Extreme ultraviolet, Photomasks, Zone plates, Microscopes, Extreme ultraviolet lithography, Objectives, Mirrors, Inspection, EUV optics

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Proceedings Article | 27 December 2002 Paper

Aerial image measurement system for 157-nm lithography

Klaus Eisner, Peter Kuschnerus, Jan-Peter Urbach, Christof Schilz, Thomas Engel, Axel Zibold, Takashi Yasui, Iwao Higashikawa

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467353

KEYWORDS: Photomasks, Lithography, Phase shifts, CCD cameras, Vacuum ultraviolet, Binary data, CCD image sensors, Microelectronics, Reticles, Lithographic illumination

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Proceedings Article | 1 August 2002 Paper

Alternating phase-shift mask inspection using multiple simultaneous illumunation techniques

Larry Zurbrick, Jan Heumann, Maciej Rudzinski, Stanley Stokowski, Jan-Peter Urbach, Lantian Wang

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476919

KEYWORDS: Inspection, Phase shift keying, Defect detection, Phase shifts, Photomasks, Defect inspection, Detection and tracking algorithms, Algorithm development, Quartz, Etching

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Proceedings Article | 11 March 2002 Paper

New approaches to alternating phase-shift mask inspection

Larry Zurbrick, Jan Heumann, Maciej Rudzinski, Stanley Stokowski, Jan-Peter Urbach, Lantian Wang

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458285

KEYWORDS: Inspection, Phase shifts, Photomasks, Defect detection, Reticles, Etching, Quartz, Algorithm development, Image transmission, Semiconducting wafers

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Showing 5 of 9 publications

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