Dr. James P. Spallas Profile

Dr. James P. Spallas

Senior R&D Manager at KLA Corp

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Publications (5)

Proceedings Article | 16 September 2014 Paper

On the limits of miniature electron column technology

Lawrence Muray, James Spallas, Dan Meisburger

Proceedings Volume 9236, 92360C (2014) https://doi.org/10.1117/12.2068617

KEYWORDS: Lenses, Optics manufacturing, Tolerancing, Electron beams, Objectives, Silicon, Charged particle optics, Manufacturing, Wafer-level optics, Monte Carlo methods

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Proceedings Article | 22 May 2009 Paper

Variable probe current using a condenser lens in a miniature electron beam column

C. Silver, J. Spallas, L. Muray

Proceedings Volume 7378, 737810 (2009) https://doi.org/10.1117/12.821805

KEYWORDS: Optical simulations, Electron beams, Scanning electron microscopy, Image resolution, Lithography, Silicon, Optical testing, Beam shaping, Manufacturing, Objectives

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Proceedings Article | 25 October 2004 Paper

Modular MEMS design and fabrication for an 80 x 80 transparent optical cross-connect switch

Andres Fernandez, Bryan Staker, Windsor Owens, Lawrence Muray, James Spallas, William Banyai

Proceedings Volume 5604, (2004) https://doi.org/10.1117/12.581901

KEYWORDS: Mirrors, Microelectromechanical systems, Switches, Electrodes, Ceramics, Matrices, Tolerancing, Beam steering, Free space optics, Manufacturing

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Proceedings Article | 6 June 1995 Paper

Self-aligned-double-level metal process for massively arrayed electron-beam lithography systems

James Spallas, Yosef Shacham-Diamand, Charles Show, Noel MacDonald

Proceedings Volume 2426, (1995) https://doi.org/10.1117/12.211193

KEYWORDS: Electrodes, Metals, Silicon, Electron beam lithography, Etching, Optical lithography, Scanning electron microscopy, Photomicroscopy, Crystals, Dielectrics

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Proceedings Article | 19 May 1995 Paper

At-wavelength testing of optics for EUV

Kenneth Goldberg, H. Beguiristain, Jeffrey Bokor, Hector Medecki, Keith Jackson, David Attwood, Gary Sommargren, James Spallas, Ralph Hostetler

Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209172

KEYWORDS: Zone plates, Wavefronts, Extreme ultraviolet, Optical testing, EUV optics, Interferometers, Diffraction, Optical components, Fringe analysis, Photomasks

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