Hui Peng Koh
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 20 March 2015 Paper
Sohan Mehta, Lakshmi Ganta, Vikrant Chauhan, Yixu Wu, Sunil Singh, Chia Ann, Lokesh Subramany, Craig Higgins, Burcin Erenturk, Ravi Srivastava, Paramjit Singh, Hui Peng Koh, David Cho
Proceedings Volume 9425, 94250B (2015) https://doi.org/10.1117/12.2087546
KEYWORDS: Critical dimension metrology, Binary data, Double patterning technology, Etching, Photomasks, Photoresist processing, Nanoimprint lithography, Image processing, Optical lithography, Neodymium

Proceedings Article | 8 October 2014 Paper
Proceedings Volume 9235, 92351I (2014) https://doi.org/10.1117/12.2068466
KEYWORDS: Inspection, Defect detection, Photomasks, Reticles, Particles, Air contamination, Optical proximity correction, Contamination, SRAF, Image analysis

Proceedings Article | 17 April 2014 Paper
Craig Higgins, Erik Verduijn, Xiang Hu, Liang Wang, Mandeep Singh, Jerome Wandell, Sohan Mehta, Jean Raymond Fakhoury, Mark Zaleski, Yi Zou, Hui Peng Koh, Pawitter Mangat
Proceedings Volume 9048, 90481Q (2014) https://doi.org/10.1117/12.2048285
KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Metals, Optical lithography, Optical proximity correction, Overlay metrology, Deep ultraviolet, Inspection

Proceedings Article | 2 April 2014 Paper
Lokesh Subramany, Michael Hsieh, Chen Li, Hui Peng Koh, David Cho, Anna Golotsvan, Vidya Ramanathan, Ramkumar Karur Shanmugam, Lipkong Yap
Proceedings Volume 9050, 90502Q (2014) https://doi.org/10.1117/12.2046598
KEYWORDS: Overlay metrology, Semiconducting wafers, Chemical mechanical planarization, Optical alignment, Metrology, Image quality, Optical filters, Image processing, Reticles, Scanners

SPIE Journal Paper | 17 December 2013 Open Access
JM3, Vol. 12, Issue 04, 042001, (December 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.4.042001
KEYWORDS: Point spread functions, Modulation transfer functions, Extreme ultraviolet lithography, Reticles, Extreme ultraviolet, Light scattering, Scattering, Photomasks, Scanning electron microscopy, Semiconducting wafers

Showing 5 of 16 publications
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