Mr. Hoi-Tou Ng Profile

Hoi-Tou Ng

at National Taiwan Univ

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Author

Publications (6)

Proceedings Article | 12 April 2013 Paper

Interference harmonics and rigorous EM spectrum analysis method for low-k1 CD Bossung tilt correction

Shuo-Yen Chou, Hoi-Tou Ng, Yi-Yin Chen, Chien-Fu Lee, Ru-Gun Liu, Tsai-Sheng Gau

Proceedings Volume 8683, 868315 (2013) https://doi.org/10.1117/12.2010599

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Diffraction, Reflectivity, Polarization, Spectrum analysis, Control systems, Critical dimension metrology, Resolution enhancement technologies

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SPIE Journal Paper | 22 August 2012

New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints

Hoi-Tou Ng, Yu-Tian Shen, Sheng-Yung Chen, Chun-Hung Liu, Philip Ng, Kuen-Yu Tsai

JM3, Vol. 11, Issue 3, 033007, (August 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.033007

KEYWORDS: Electron beam lithography, Monte Carlo methods, Line edge roughness, Computer simulations, Critical dimension metrology, Transistors, Optical simulations, Diffusion, Optimization (mathematics), Point spread functions

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Proceedings Article | 5 April 2012 Paper

Electron-beam proximity effect model calibration for fabricating scatterometry calibration samples

Yu-Tian Shen, Chun-Hung Liu, Chih-Yu Chen, Hoi-Tou Ng, Kuen-Yu Tsai, Fu-Ming Wang, Chieh-Hsiung Kuan, Yen-Min Lee, Hsin-Hung Cheng, Jia-Han Li, Alek Chen

Proceedings Volume 8324, 83242K (2012) https://doi.org/10.1117/12.918109

KEYWORDS: Calibration, Line edge roughness, Scatterometry, Point spread functions, Process modeling, Scanning electron microscopy, Metrology, Scattering, Semiconducting wafers, Cadmium

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SPIE Journal Paper | 13 March 2012

New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography

Chun-Hung Liu, Hoi-Tou Ng, Kuen-Yu Tsai

JM3, Vol. 11, Issue 1, 013009, (March 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.1.013009

KEYWORDS: Point spread functions, Calibration, Optical lithography, Lithography, Photoresist processing, Optical simulations, Electron beam lithography, Tolerancing, Scattering, Critical dimension metrology

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Proceedings Article | 14 December 2009 Paper

Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithography

Sheng-Yung Chen, Kuen-Yu Tsai, Hoi-Tou Ng, Chi-Hsiang Fan, Ting-Hang Pei, Chieh-Hsiung Kuan, Yung-Yaw Chen, Jia-Yush Yen

Proceedings Volume 7520, 75202K (2009) https://doi.org/10.1117/12.837048

KEYWORDS: Sensors, Monte Carlo methods, Electron beams, Signal detection, Lithography, Electron beam lithography, Detector arrays, Optical simulations, Semiconducting wafers, Silicon

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Proceedings Article | 4 December 2008 Paper

A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography

Chun-Hung Liu, Hoi-Tou Ng, Philip Ng, Kuen-Yu Tsai, Shy-Jay Lin, Jeng-Homg Chen

Proceedings Volume 7140, 71401I (2008) https://doi.org/10.1117/12.804693

KEYWORDS: Monte Carlo methods, Scattering, Electron beam lithography, Silicon, Data modeling, Polymethylmethacrylate, Laser scattering, Direct write lithography, Computer simulations, Backscatter

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Showing 5 of 6 publications

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