Mr. Hiroyuki Kurita Profile

Hiroyuki Kurita

Applications Manager at KLA Japan

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 18 April 2013 Paper

Quality metric for accurate overlay control in <20nm nodes

Dana Klein, Eran Amit, Guy Cohen, Nuriel Amir, Michael Har-Zvi, Chin-Chou Kevin Huang, Ramkumar Karur-Shanmugam, Bill Pierson, Cindy Kato, Hiroyuki Kurita

Proceedings Volume 8681, 86811J (2013) https://doi.org/10.1117/12.2011454

KEYWORDS: Target detection, Semiconducting wafers, Overlay metrology, Yield improvement, Metrology, Calibration, Error analysis, Semiconductors, Manufacturing, Lithography

Read Abstract +

Proceedings Article | 18 April 2013 Paper

Overlay accuracy calibration

Eran Amit, Dana Klein, Guy Cohen, Nuriel Amir, Michael Har-Zvi, Cindy Kato, Hiroyuki Kurita

Proceedings Volume 8681, 86811G (2013) https://doi.org/10.1117/12.2011416

KEYWORDS: Calibration, Overlay metrology, Metrology, Semiconducting wafers, Optical filters, Neodymium, Time metrology, Process control, Ions, Data modeling

Read Abstract +

Proceedings Article | 20 April 2011 Paper

Improved overlay control using robust outlier removal methods

John Robinson, Osamu Fujita, Hiroyuki Kurita, Pavel Izikson, Dana Klein, Inna Tarshish-Shapir

Proceedings Volume 7971, 79711G (2011) https://doi.org/10.1117/12.879494

KEYWORDS: Overlay metrology, Data modeling, Metrology, Semiconductor manufacturing, Semiconductors, Semiconducting wafers, Process control, Numerical simulations, Data processing, Instrument modeling

Read Abstract +

Proceedings Article | 2 April 2010 Paper

Automated optimized overlay sampling for high-order processing in double patterning lithography

Chiew-seng Koay, Matthew Colburn, Pavel Izikson, John Robinson, Cindy Kato, Hiroyuki Kurita, Venkat Nagaswami

Proceedings Volume 7638, 76381R (2010) https://doi.org/10.1117/12.846371

KEYWORDS: Semiconducting wafers, Statistical modeling, Lithography, Overlay metrology, Double patterning technology, Photomasks, Optical lithography, Metrology, Data modeling, Mathematical modeling

Read Abstract +

Proceedings Article | 23 March 2009 Paper

Sampling for advanced overlay process control

Cindy Kato, Hiroyuki Kurita, Pavel Izikson, John Robinson

Proceedings Volume 7272, 727206 (2009) https://doi.org/10.1117/12.813568

KEYWORDS: Semiconducting wafers, Overlay metrology, Process control, Time metrology, Monte Carlo methods, Optical lithography, Statistical methods, Control systems, Immersion lithography, Lithography

Read Abstract +

Proceedings Article | 24 May 2004 Paper

Improved overlay metrology device correlation on 90-nm logic processes

Atsushi Ueno, Kouichirou Tsujita, Hiroyuki Kurita, Yasuhisa Iwata, Mark Ghinovker, Jorge Poplawski, Elyakim Kassel, Mike Adel

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534522

KEYWORDS: Overlay metrology, Personal protective equipment, Scanning electron microscopy, Metrology, Scanners, Lithography, Optical design, Metals, Semiconducting wafers, Monochromatic aberrations

Read Abstract +

Proceedings Article | 16 July 2002 Paper

TIS-WIS interaction characterization on overlay measurement tool

Kenji Hoshi, Eiichi Kawamura, Hiroshi Morohoshi, Hideki Ina, Takanori Fujimura, Hiroyuki Kurita, Joel Seligson

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473514

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Monochromatic aberrations, Chemical mechanical planarization, Optical alignment, Wafer-level optics, Tungsten, Metals, Silicon

Read Abstract +

Showing 5 of 7 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years