Dr. Hiromi Ezaki Profile

Dr. Hiromi Ezaki

Associate Professor at Tokyo Polytechnic Univ

SPIE Involvement:

Author

Publications (5)

SPIE Journal Paper | 1 May 2007

Classification of undulated wavefront aberration in projection optics by considering its physical effects

Masato Shibuya, Nobuaki Watanabe, Masayuki Yamamoto, Toshihumi Fukui, Hiromi Ezaki, Tomohiro Kiire, Suezou Nakadate

OE, Vol. 46, Issue 05, 053001, (May 2007) https://doi.org/10.1117/12.10.1117/1.2734995

KEYWORDS: Wavefront aberrations, Projection systems, Wafer-level optics, Optical engineering, Spatial frequencies, Wavefronts, Reticles, Semiconducting wafers, Wave propagation, Point spread functions

Read Abstract +

Proceedings Article | 12 May 2005 Paper

Considering the flare by introducing the random aberration and non-conserved aberration

Masato Shibuya, Nobuaki Watanabe, Hiromi Ezaki, Suezou Nakadate

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600818

KEYWORDS: Wavefront aberrations, Wavefronts, Reticles, Wave propagation, Semiconducting wafers, Fizeau interferometers, Diffraction, Geometrical optics, Fourier transforms, Projection systems

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Random aberration and local flare

Masato Shibuya, Hiromi Ezaki, Toshihumi Fukui, Nobuaki Watanabe, Akira Nishikata

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.533979

KEYWORDS: Wavefront aberrations, Wavefronts, Projection systems, Optical lithography, Chromium, Photomasks, Light scattering, Critical dimension metrology, Numerical simulations, Engineering education

Read Abstract +

Proceedings Article | 26 June 2003 Paper

Optical lithography at half the Rayleigh resolution limit by two-photon absorption resist

Hiromi Ezaki, Masato Shibuya

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485500

KEYWORDS: Absorption, Polarization, Super resolution, Photon polarization, Optical lithography, Diffraction, Beam splitters, Resolution enhancement technologies, Grazing incidence, Mirrors

Read Abstract +

Proceedings Article | 30 July 2002 Paper

Improvement of two-photon absorption lithography

Masato Shibuya, Hiromi Ezaki

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474547

KEYWORDS: Resolution enhancement technologies, Photon polarization, Super resolution, Absorption, Lithography, Polarization, Sensors, Photomasks, Mirrors, Molecules

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years