The nanostructuring on titanium surfaces is studied by low-energy argon ion irradiation. The surfaces are analysed by EBSD for grain orientation mapping, SEM for surface imaging, WLI and AFM for topography characterization, XPS and ToF-SIMS for chemical surface analysis. Under normal incidence specific nanoripple structures are formed, whereas the morphology is defined by the crystallographic conditions only. A characteristic relation between grain orientation and ripple size is elaborated. Experiments on co-deposition with Al, C, Cu, Fe, and Si indicate that Fe impurities influence nanostructuring. The effect of inclined ion incidence shows an overlay between orientation-dependent and process geometry-related structure formation.
Ion beam finishing techniques are commonly used for improvement of surface error topography of optical devices. Optical aluminum surfaces after manufacturing by single-point diamond turning meet the requirements for applications in the infrared spectral range. However, optics used for applications in the short-wavelength visible and ultraviolet spectral range demand improved surface qualities. To overcome the limitations mainly caused by structural and compositional inhomogeneities of aluminum alloys, a reactive ion beam machining process using oxygen and nitrogen operating gas is applied. This technology enables direct surface machining while preserving the initial roughness up to a 1-μm etching depth using low-energy ion beams. Moreover, the use of oxygen allows us to smooth the surface in the microroughness regime. Based on Monte-Carlo simulations and roughness evolution measured by atomic force microscopy, a more detailed discussion of the ion beam process is presented. Hence, a model scheme for direct smoothing of high-frequency surface features is suggested.
Reflection losses due to refractive index mismatch limit the obtainable diffraction efficiencies for transmission gratings in the highly dispersive regime, i.e., with period to wavelength ratios smaller than 0.7. The design and fabrication of such gratings with high-diffraction efficiencies (≥94 % , Littrow configuration) will be discussed with an emphasis on process strategies to control the profiles in the reactive ion beam etching step. Experimental results from the manufacturing of monolithic fused silica pulse compression gratings with 3000 L / mm optimized for a center wavelength of 519 nm will be presented. The influence of different etching parameters such as etch gas mixture, ion incidence angle, and acceleration voltage of the ion source on profile depth, side-wall angle, duty cycle, and ultimately diffraction efficiencies will be discussed.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.