KEYWORDS: Near field scanning optical microscopy, Self-assembled monolayers, Gold, Etching, Optical lithography, Ultraviolet radiation, Proteins, Nanolithography, Nanostructures, Near field
Using a scanning near-field optical microscope coupled to a UV laser, an approach we term scanning near-field
photolithography (SNP), structures as small as 9 nm (ca. λ/30) may be fabricated in self-assembled monolayers of
alkanethiols on gold surfaces. Selective exposure of the adsorbate molecules in the near field leads to photoconversion of
the alkylthiolate to a weakly bound alkylsulfonate which may be displaced readily be a contrasting thiol, leading to a
chemical pattern, or used as a resist for the selective etching of the underlying metal. A novel ultra-mild etch for gold is
reported, and used to etch structures as small as 9 nm. Photopatterning of oligo(ethylene glycol) (OEG) terminated selfassembled
monolayers facilitates the fabrication of biomolecular nanostructures. Selective removal of the protein-resistant
OEG terminated adsorbates created regions that may be functionalized with a second thiol and derivatized with
a biomolecule. Finally, the application of SNP to nanopatterning on oxide surfaces is demonstrated. Selective exposure
of monolayers of phosphonic acids adsorbed onto aluminum oxide leads to cleavage of the P-C bond and desorption of
the adsorbate molecule. Subsequent etching, using aqueous based, yields structures as small as 100 nm.
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