Geoffrey A. Gaines
at Lawrence Berkeley National Lab
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 23 March 2020 Presentation + Paper
Chris Anderson, Arnaud Allezy, Weilun Chao, Lucas Conley, Carl Cork, Will Cork, Rene Delano, Jason DePonte, Michael Dickinson, Geoff Gaines, Jeff Gamsby, Eric Gullikson, Gideon Jones, Lauren McQuade, Ryan Miyakawa, Patrick Naulleau, Seno Rekawa, Farhad Salmassi, Brandon Vollmer, Daniel Zehm, Wenhua Zhu
Proceedings Volume 11323, 113230B (2020) https://doi.org/10.1117/12.2552125
KEYWORDS: Mirrors, Scanners, Semiconducting wafers, Scanning electron microscopy, Camera shutters, Image processing, Vibration isolation, Projection systems

Proceedings Article | 26 March 2019 Presentation + Paper
Christopher Anderson, Arnaud Allezy, Weilun Chao, Carl Cork, Will Cork, Rene Delano, Jason DePonte, Michael Dickinson, Geoff Gaines, Jeff Gamsby, Eric Gullikson, Gideon Jones, Stephen Meyers, Ryan Miyakawa, Patrick Naulleau, Senajith Rekawa, Farhad Salmassi, Brandon Vollmer, Daniel Zehm, Wenhua Zhu
Proceedings Volume 10957, 1095708 (2019) https://doi.org/10.1117/12.2516339
KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Optical lithography, Monochromatic aberrations, Line width roughness, Photoresist materials, Image processing, Projection systems

Proceedings Article | 26 March 2019 Paper
Ryan Miyakawa, Chris Anderson, Wenhua Zhu, Geoff Gaines, Jeff Gamsby, Carl Cork, Gideon Jones, Michael Dickenson, Seno Rekawa, Weilun Chao, Sharon Oh, Patrick Naulleau
Proceedings Volume 10957, 109571X (2019) https://doi.org/10.1117/12.2516384
KEYWORDS: Wavefronts, Diffraction gratings, Interferometry, Shearing interferometers, Optical alignment, Diffraction, Optical design, Sensors, Multiplexing, Monochromatic aberrations

Proceedings Article | 12 October 2018 Presentation
Proceedings Volume 10809, 1080911 (2018) https://doi.org/10.1117/12.2501953
KEYWORDS: Wavefronts, Error analysis, Interferometry, Data modeling, Extreme ultraviolet, Shearing interferometers, Monochromatic aberrations, Projection lithography, Objectives, Optical resolution

Proceedings Article | 3 April 2018 Open Access Paper
Proceedings Volume 10570, 105702D (2018) https://doi.org/10.1117/12.2326639

Showing 5 of 22 publications
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