Dr. Frank A. Driessen Profile

Dr. Frank A. Driessen

Senior Marketing Manager, Holistic Lithography

SPIE Involvement:

Author

Publications (20)

Proceedings Article | 17 April 2014 Paper

Paper

EUV source-mask optimization for 7nm node and beyond

Xiaofeng Liu, Rafael Howell, Stephen Hsu, Kaiyu Yang, Keith Gronlund, Frank Driessen, Hua-Yu Liu, Steven Hansen, Koen van Ingen Schenau, Thijs Hollink, Paul van Adrichem, Kars Troost, Jörg Zimmermann, Oliver Schumann, Christoph Hennerkes, Paul Gräupner

Proceedings Volume 9048, 90480Q (2014) https://doi.org/10.1117/12.2047584

KEYWORDS: Source mask optimization, Photomasks, Extreme ultraviolet, Scanners, Fiber optic illuminators, 3D modeling, Optimization (mathematics), Extreme ultraviolet lithography, Deep ultraviolet, Algorithm development

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Proceedings Article | 31 March 2014 Paper

Paper

Advanced OPC Mask-3D and Resist-3D modeling

A. Szucs, J. Planchot, V. Farys, E. Yesilada, L. Depre, S. Kapasi, C. Gourgon, M. Besacier, O. Mouraille, F. Driessen

Proceedings Volume 9052, 905208 (2014) https://doi.org/10.1117/12.2047281

KEYWORDS: 3D modeling, Calibration, Data modeling, Photomasks, Lithography, Semiconducting wafers, Scanning electron microscopy, Atomic force microscopy, Process control, Etching

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Proceedings Article | 14 October 2011 Paper

Paper

Holistic lithography for EUV: NXE:3100 characterization of first printed wafers using an advanced scanner model and scatterometry

Frank A. J. M. Driessen, Natalia Davydova, J. Jiang, H. Kang, V. Vaenkatesan, D. Oorschot, I. Kim, S. Kang, Y. Lee, J. Yeo, K. Gronlund, H. Liu, K. van Ingen-Schenau, R. Peeters, C. Wagner, J. Zimmermann, O. Schumann

Proceedings Volume 8166, 81660Z (2011) https://doi.org/10.1117/12.898955

KEYWORDS: Semiconducting wafers, Scanners, Photomasks, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Reflectivity, Deep ultraviolet, Metrology, Critical dimension metrology

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Proceedings Article | 14 October 2011 Paper

Paper

Mask aspects of EUVL imaging at 27nm node and below

Natalia Davydova, Eelco van Setten, Sang-In Han, Mark van de Kerkhof, Robert de Kruif, Dorothe Oorschot, John Zimmerman, Ad Lammers, Brid Connolly, Frank Driessen, Anton van Oosten, Mircea Dusa, Youri van Dommelen, Noreen Harned, Jiong Jiang, Wei Liu, Hoyoung Kang, Hua-yu Liu

Proceedings Volume 8166, 816624 (2011) https://doi.org/10.1117/12.896816

KEYWORDS: Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Apodization, Optical proximity correction, Photoresist processing, Scanners, Semiconducting wafers, Multilayers

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Proceedings Article | 13 March 2009 Paper

Paper

Enhanced layout optimization of sub-45nm standard: memory cells and its effects

Seung Weon Paek, Dae Hyun Jang, Joo Hyun Park, Naya Ha, Byung-Moo Kim, Hyo Sig Won, Kyu-Myung Choi, Kuang-Kuo Lin, Simon Klaver, Shobhit Malik, Michiel Oostindie, Frank Driessen

Proceedings Volume 7275, 72751M (2009) https://doi.org/10.1117/12.815413

KEYWORDS: Design for manufacturing, Semiconducting wafers, Yield improvement, Manufacturing, Laser induced breakdown spectroscopy, Standards development, Tolerancing, Optimization (mathematics), Optical proximity correction, Silicon

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Proceedings Article | 17 October 2008 Paper

Paper

Flexible sensitivity inspection with TK-CMI software for criticality-awareness

Frank Driessen, Jamila Gunawerdana, Yakuko Saito, Hideo Tsuchiya, Yoshitake Tsuji

Proceedings Volume 7122, 712222 (2008) https://doi.org/10.1117/12.803593

KEYWORDS: Inspection, Photomasks, Defect detection, Optical proximity correction, Data processing, Defect inspection, Data conversion, Manufacturing, Mask making, Databases

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Proceedings Article | 12 March 2008 Paper

Paper

DFM software for photomask production and qualification of its accuracy and functionality

Frank A. J. M. Driessen, J. Westra, K. G. Haens, E. Morita

Proceedings Volume 6925, 69251T (2008) https://doi.org/10.1117/12.776666

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Design for manufacturing, Model-based design, Palladium, Image resolution, Diffraction, Calibration, Manufacturing

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Proceedings Article | 30 October 2007 Paper

Paper

Silicon-verified automatic DFM layout optimization: a calibration-lite model-based application to standard cells

Kuang-Kuo Lin, Ban Wong, Frank Driessen, Etsuya Morita, Simon Klaver

Proceedings Volume 6730, 67300X (2007) https://doi.org/10.1117/12.747021

KEYWORDS: Design for manufacturing, Lithography, Silicon, Scanning electron microscopy, Calibration, Optimization (mathematics), Semiconducting wafers, Optical proximity correction, Model-based design, Semiconductors

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Proceedings Article | 30 October 2007 Paper

Paper

DFM for maskmaking: design-aware flexible mask-defect analysis

Frank Driessen, J. Westra, M. Scheffer, K. Kawakami, E. Tsujimoto, M. Yamaji, T. Kawashima, N. Hayashi

Proceedings Volume 6730, 67300O (2007) https://doi.org/10.1117/12.746735

KEYWORDS: Inspection, Photomasks, Manufacturing, Design for manufacturing, Reticles, Image enhancement, Defect inspection, Image transmission, Electronic design automation, Human-machine interfaces

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We present a novel software system that combines design intent as known by EDA designers with defect inspection results from the maskshop to analyze the severity of defects on photomasks. The software -named Takumi Design- Driven Defect Analyzer (TK-D3A)- analyzes defects by combining actions in the image domain with actions in the design domain and outputs amongst others flexible mask-repair decisions in production formats used by the maskshop. Furthermore, TK-D3A outputs clips of layout (GDS/OASIS) that can be viewed with its graphical user interface for easy review of the defects and associated repair decisions. As inputs the system uses reticle defect-inspection data (text and images) and the respective multi-layer design layouts with the definitions of criticalities. The system does not require confidential design data from IDM, Fabless Design House, or Foundry to be sent to the maskshop and it also has minimal impact on the maskshop's mode of operation. The output of TK-D3A is designed to realize value to the maskshop and its customers in the forms of: 1) improved yield, 2) reduction of delivery times of masks to customers, and 3) enhanced utilization of the maskshop's installed tool base. The system was qualified together with a major IDM on a large set of production reticles in the 90 and beyond-65 nm technology nodes of which results will be presented that show the benefits for maskmaking. The accuracy in detecting defects is extremely high. We show the system's capability to analyze defects well below the pixel resolution of all inspection tools used, as well as the capability to extract multiple types of transmission defects. All of these defects are analyzed design-criticality-aware by TK-D3A, resulting in a large fraction of defects that do not need to be repaired because they are located in non-critical or less-critical parts of the layout, or, more importantly, turn out to be repairable or negligible despite of originally being classified as unrepairable when no such criticality knowledge is used. Finally, we show that the runtimes of TK-D3A are relatively short, despite the fact that the system operates on full-chip designs.

Proceedings Article | 6 December 2004 Paper

Paper

Device analysis: a way to reduce patterning cost at mask and wafer level?

Artur Balasinski, Frank Driessen

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569904

KEYWORDS: Photomasks, Field effect transistors, Optical proximity correction, Semiconducting wafers, Device simulation, Silicon, Critical dimension metrology, Image processing, Optical lithography, Reticles

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Proceedings Article | 28 May 2004 Paper

Paper

A 90-nm design-rule patterning application using alt-PSM with KrF lithography for volume manufacturing at k1=0.27

Stefan Majoni, Frank Driessen, Bryan Kasprowicz, Paul Harris

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544254

KEYWORDS: Photomasks, Lithography, Manufacturing, Nanoimprint lithography, Optical lithography, Phase shifts, Photoresist processing, Semiconducting wafers, Monochromatic aberrations, Semiconductors

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Proceedings Article | 3 May 2004 Paper

Paper

A 65-nm node SRAM solution using alt-PSM with ArF lithography

Frank Driessen, Mary Zawadzki, Prakash Krishnan, Artur Balasinski, Geert Vandenberghe

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.540311

KEYWORDS: Binary data, Photomasks, Lithography, Semiconducting wafers, Fiber optic illuminators, Lithographic illumination, Control systems, Critical dimension metrology, Optics manufacturing, Manufacturing

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Proceedings Article | 26 June 2003 Paper

Paper

Full phase-shifting methodology for 65-nm node lithography

Christophe Pierrat, Frank Driessen, Geert Vandenberghe

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485440

KEYWORDS: Phase shifts, Photomasks, Binary data, Printing, Semiconducting wafers, Lithography, Scanners, Optical proximity correction, 193nm lithography, Quartz

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Proceedings Article | 26 June 2003 Paper

Paper

Extending ArF to the 65-nm node with full-phase lithography

Frank Driessen, Christophe Pierrat, Geert Vandenberghe, Kurt Ronse, Paul van Adrichem, Hua-Yu Liu

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485426

KEYWORDS: Photomasks, Lithography, Binary data, Optical lithography, Optical proximity correction, Logic, Scanning electron microscopy, Printing, Chromium, Diffraction

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Proceedings Article | 2 June 2003 Paper

Paper

Use of silicon-versus-layout verification (SiVL) in process control of wafer lithography and mask-making metrology

Paul van Adrichem, Frank Driessen, Kees van Hasselt

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485001

KEYWORDS: Photomasks, Semiconducting wafers, Computed tomography, Process control, Optical proximity correction, Silicon, Lithography, Metrology, Error analysis, Binary data

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Proceedings Article | 27 December 2002 Paper

Paper

Mask error enhancement-factor (MEEF) metrology using automated scripts in CATS

Paul J. M. van Adrichem, Frank Driessen, Kees van Hasselt, Hans-Juergen Brueck

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467755

KEYWORDS: Reticles, Photomasks, Semiconducting wafers, Computed tomography, Critical dimension metrology, Optical proximity correction, Image processing, Binary data, Metrology, Semiconductors

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Proceedings Article | 30 July 2002 Paper

Paper

Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node

Frank Driessen, Paul van Adrichem, Vicky Philipsen, Rik Jonckheere, Hua-Yu Liu, Linard Karklin

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474498

KEYWORDS: Binary data, Photomasks, Printing, Critical dimension metrology, Lithography, Antimony, Reticles, Chromium, Transparency, Resolution enhancement technologies

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Proceedings Article | 30 July 2002 Paper

Paper

Model-based corrections for complementary phase-shift mask toward 70-nm technology node

Frank Driessen, Geert Vandenberghe, Monique Ercken, Patrick Montgomery, Kurt Ronse, Paul van Adrichem, Jason Li, Hua-Yu Liu, Linard Karklin

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.490520

KEYWORDS: Model-based design

Proceedings Article | 11 March 2002 Paper

Paper

Performance optimization of the double-exposure alternating PSM for (sub-)100-nm ICs

Geert Vandenberghe, Frank Driessen, Paul Vanadrichem, Kurt Ronse, Jason Li, Linard Karklin

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458316

KEYWORDS: Photomasks, Optical proximity correction, Binary data, Reticles, Semiconducting wafers, Optical lithography, Logic, Resolution enhancement technologies, Scanning electron microscopy, Etching

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Proceedings Article | 11 March 2002 Paper

Paper

New generation photomasks: 193-nm defect printability study

Linard Karklin, Paul van Adrichem, Frank Driessen, Stan Mazor

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458315

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Printing, Critical dimension metrology, Binary data, Resolution enhancement technologies, Lithographic illumination, Image processing, Optical lithography

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Showing 5 of 20 publications

Conference Committee Involvement (6)

Photomask Technology

15 September 2009 | Monterey, California, United States

Photomask Technology

7 October 2008 | Monterey, California, United States

Photomask Technology

18 September 2007 | Monterey, California, United States

Photomask Technology

19 September 2006 | Monterey, California, United States

Photomask Technology

3 October 2005 | Monterey, California, United States

Showing 5 of 6 Conference Committees

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