The NanoFrazor employs thermal scanning probe lithography (tSPL) and direct laser sublimation to pattern and inspect nanoscale structures. This technology addresses complex nanodevice fabrication challenges by enabling markerless overlay, sub-nanometer precise 3D grayscale lithography, and integration into inert atmospheres for sensitive materials.
Automation of NanoFrazor lithography is a natural progression, improving reliability, repeatability, and usability. Scripting and unprecedented patterning endurance allow for automated, markerless overlay of diverse features, benefiting applications requiring precise feature placement on pre-existing structures, like nanopillars on micro-posts or defined channels in FinFET devices.
The upcoming multi-tip version of the NanoFrazor, the Decapede, enhances tSPL scalability without sacrificing resolution, enabling uninterrupted large-area patterning with parallelized tips and improved reproducibility. Use-cases demonstrate multi-tip patterning and the integration of 47 grating couplers onto silicon waveguides, creating unique nanophotonic devices. These advancements pave the way for scaled-up automated tSPL in More-than-Moore applications.
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