Hydride Vapor Phase Epitaxy (HVPE) makes use of chloride III-Cl and hydride V-H3 gaseous growth precursors. It is
known as a near-equilibrium process, providing the widest range of growth rates from 1 to more than 100 μm/h. When it
comes to metal catalyst-assisted VLS (vapor-liquid-solid) growth, the physics of HVPE growth is maintained: high
dechlorination frequency, high axial growth rate of nanowires (NWs) up to 170 μm/h. The remarkable features of NWs
grown by HVPE are the untapered morphology with constant diameter and the stacking fault-free crystalline phase.
Record pure zinc blende cubic phase for 20 μm long GaAs NWs with radii of 10 and 5 nm is shown. The absence of
wurtzite phase in GaAs NWs grown by HVPE whatever the diameter is discussed with respect to surface energetic
grounds and kinetics. Ni assisted, Ni-Au assisted and catalyst-free HVPE growth of wurtzite GaN NWs is also
addressed. Micro-photoluminescence spectroscopy analysis revealed GaN nanowires of great optical quality, with a
FWHM of 1 meV at 10 K for the neutral donor bound exciton transition.
The feasibility of micrometer scale morphologically controlled 1D stripe arrays by selective hydride vapour phase epitaxy (HVPE) single step was assessed. HVPE is a near-equilibrium growth process which offers perfect selectivity whatever the pattern design thus giving rise to a great flexibility. The HVPE growth being mainly governed by the surface kinetics intrinsic anisotropy of the crystal, we have demonstrated that various growth morphologies could be stabilised at a mesoscopic scale by controlling the hierarchy of the growth rates of the low index faces of III-V crystals via the growth temperature and the composition of the vapour phase. Micrometer scale dielectric periodic structures constituted of 1μm wide GaAs beams alternately stacked with air were then grown by selective HVPE on GaAs substrates. Potential of the HVPE growth technic for the making of submicrometer scale structures is finally discussed.
InAs/InP quantum well (QW) structures are grown on InP substrates by hydride vapor phase epitaxy (HYPE) in a continuous mCi H2 HC1 flow with alternate supply of AsH3 and PH3. Photoluminescence peaks due to InAs QW are clearly detected with the higher energy ever reported (1. 23 eV) and with very good value for the full half width maximum (FHWM up to 1 3 meV). The evolution of the peak emission as a function of thickness leads us to determine a critical thickness of 7-8 ML for the InAs/InP system.
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