Dr. Dmitriy V. Likhachev Profile

Dr. Dmitriy V. Likhachev

Member of Technical Staff at GLOBALFOUNDRIES Dresden Module One

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Publications (6)

Proceedings Article | 10 August 2023 Presentation + Paper

Trajectory-based sensitivity analysis in spectroscopic ellipsometry modeling

Dmitriy Likhachev

Proceedings Volume 12619, 1261905 (2023) https://doi.org/10.1117/12.2673627

KEYWORDS: Data modeling, Spectroscopic ellipsometry, Modeling, Oscillators, Dielectrics, Performance modeling, Overfitting, Optical metrology

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Proceedings Article | 22 March 2018 Presentation + Paper

Context-based virtual metrology

Peter Ebersbach, Adam Urbanowicz, Dmitriy Likhachev, Carsten Hartig, Michael Shifrin

Proceedings Volume 10585, 1058514 (2018) https://doi.org/10.1117/12.2302498

KEYWORDS: Metrology, Semiconducting wafers, Data modeling, Machine learning, Data processing, Etching, Optics manufacturing, Wafer-level optics, Manufacturing, Process control

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Proceedings Article | 26 June 2017 Paper

B-spline parameterization of the dielectric function and information criteria: the craft of non-overfitting

Dmitriy Likhachev

Proceedings Volume 10330, 103300B (2017) https://doi.org/10.1117/12.2270249

KEYWORDS: Spectroscopic ellipsometry, Mathematical modeling, Data modeling, Data analysis, Optical metrology, Oscillators, Statistical analysis, Modeling

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Proceedings Article | 26 June 2017 Paper

Dielectric function parameterization by penalized splines

Dmitriy Likhachev

Proceedings Volume 10330, 103301J (2017) https://doi.org/10.1117/12.2270259

KEYWORDS: Dielectrics, Semiconductors, Optical metrology, Spectroscopic ellipsometry, Modeling, 3D modeling, Mathematical modeling, Data analysis, Semiconductor manufacturing, Manufacturing

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Proceedings Article | 28 March 2017 Presentation + Paper

Advanced optical modeling of TiN metal hard mask for scatterometric critical dimension metrology

Peter Ebersbach, Adam Urbanowicz, Dmitriy Likhachev, Carsten Hartig

Proceedings Volume 10145, 101451G (2017) https://doi.org/10.1117/12.2258659

KEYWORDS: Tin, Metals, Optical properties, Data modeling, Dielectrics, Photomasks, Semiconducting wafers, Optics manufacturing, Etching, Diffractive optical elements

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Proceedings Article | 18 March 2016 Paper

Monitoring of ion implantation in microelectronics production environment using multi-channel reflectometry

Peter Ebersbach, Adam Urbanowicz, Dmitry Likhachev, Carsten Hartig

Proceedings Volume 9778, 977812 (2016) https://doi.org/10.1117/12.2220184

KEYWORDS: Interfaces, Silica, Reflectometry, Scatterometry, Optical properties, Silicon, Critical dimension metrology, Crystals, Ion implantation, Metrology, Semiconducting wafers, Data modeling, Ions, Annealing, Oxides, Diffractive optical elements, Magnesium

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Showing 5 of 6 publications

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