KEYWORDS: Optical lithography, Lithography, Optical fibers, Near field optics, Photoresist materials, Silicon, Zone plates, Optical components, Electron beam lithography, Ion beams
In this work, nanolithographic patterning by means of a nanostencil inscribed on an optical fiber tip is presented. Oneshot registration of multiple-sized features within a 4 μm diameter patterning circle has been experimentally tested on photoresist AZ5214E coated silicon substrate, with features as small as 160 nm beign obtained, replicating the original stencil with excellent agreement. The nanostencil was created by focused ion beam (FIB) milling, although other techniques such as femtosecond laser ablation or pattern transfer to fiber tip can also be employed. Stencils can be arbitrary or based on optical elementary designs such as line patterns, photonic crystals, Fresnel zone plates or photon sieve. Exact transfer of the inscribed pattern is obtained while in contact lithography, while proximity exposure enables complex modulation of the optical near-field by the phase and/or amplitude stencil mask. This allows for optical interference to occur, in full 3D space, rendering sub-wavelength spot focusing, annular pattern formation, as well as the formation of 3D complex shapes. Experimentally, a 405 nm laser beam with 17 mW power was launched into the core of UV-Visible single mode fiber (S405-XP) on which end a photon sieve was previously inscribed by FIB. This tip was scanned over the photoresist. Patterning consisted of 1Dscans, for which a minimum line width of 350 nm was obtained.Additionally, step-and-repeat patterning of the photon sieve fiber tip stencil was performed with, all features down to 160 nm being clearly resolved.
Black silicon is surface modification by reactive ion etching that creates a forest of silicon micro-spikes and increases surface area of the sample. When the spikes’ height exceed an optical wavelength, light is trapped on the surface through multiple pathway scattering, increasing the optical absorption of visible and near infrared radiation. Cerium oxide (CeO2) is believed to have good photoactivity, and finds many applications including photoelectrolysis. However, the large band gap limits the efficiency of the water splitting process. We suggest black silicon surfaces as substrates for CeO2 sputter coating to increase photon-material interaction. An additional catalytic layer of platinum is deposited to create highly energetic electrons as a result of plasmonic resonance and enhances incident photon to current efficiency (IPCE). The difference of surface current for laser on and off condition is found to be 32 times higher in a nanolayered coated black silicon sample as compared to flat silicon. The resistance of flat silicon substrate was 11 Ω for laser-off state, decreasing to 9 Ω when the laser was turned on. On the other hand, the black silicon substrate sample had a higher resistance of 70 Ω in dark which decreased to 1.5 Ω for laser on state.
The overall procedure toward the implementation of a compact tunable athermal filter mounted on a piezoelectric actuator and based on a π-shift chirped fiber Bragg grating is presented. This package ensures an active tunablility over 2 nm with a cross thermal induced Bragg wavelength shift below 100 pm over a temperature range from −20°C to +80°C. The proposed filter makes use of the overall response of a π-shift chirped fiber Bragg grating and a bulk broadband microfilter that enables a sharp optical transmission spectrum response having a FWHM below 20 pm within a 2 nm region and 20 dB rejection band to be obtained.
An ultra-narrow transmission filtering scheme that combines the response of a phase-shift fiber Bragg grating and a
broadband rejection micro-optical filter is proposed. The full implementation process is disclosed starting from the
simulated spectral responses, grating fabrication and final assembling and test. This scheme intends to be an alternative
and feasible engineering solution for one-end optical filtering interface for signal processing and analysis.
We report on the use of a frequency-reflectometry domain technique for referencing optical intensity sensors located
between two fibre Bragg gratings. The experiment combines the concept of frequency modulated continuous wave with
the spectrally selective mirror properties of fibre Bragg gratings to interrogate with referencing properties intensity based
sensors. Multiplexing two of these sensors using this technique in a parallel topology system was also experimentally
demonstrated. Due to the use of different fibre lengths (delay lines), signals from the fibre Bragg gratings located at
different positions in an array are separated in the frequency-domain.
This paper presents a sensing head based on a Bragg grating written in an elliptical cladding Hi-Bi fibre partially exposed to chemical etching for reduction of the cladding diameter. With this sensing head geometry different strain and similar temperature sensitivities are achieved.
An intensity-referenced temperature-independent curvature measurement technique using a smart composite comprising two chirped fiber Bragg gratings is demonstrated. The two gratings are embedded on opposite sides of a composite laminate and act simultaneously as curvature sensors and as wavelength discriminators, enabling an unambiguous measurement of the composite radius of curvature.
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