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Ding Kai
at Intel Semiconductor (Dalian) Ltd
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Publications (1)
Proceedings Article | 26 March 2019 Paper
Alignment sampling by thorough run-to-run simulation
Alex Ren, Ding Kai, Boris Habets, Steffen Guhlemann, Norman Birnstein, Alexander Mühle, Patrick Lomtscher, Rex Liu
Proceedings Volume 10959, 109592O (2019) https://doi.org/10.1117/12.2515001
KEYWORDS: Optical alignment, Overlay metrology, Semiconducting wafers, Optimization (mathematics), Computer simulations, Data modeling, Semiconductors, Metrology, Manufacturing
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