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Daniel T. Tsunami
Graduate Student at Portland State Univ
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Publications (1)
Proceedings Article | 17 May 2005 Paper
Oxide etch rate estimation using plasma impedance monitoring
Daniel Tsunami, James McNames, Bruce Whitefield, Paul Rudolph, Jeff Zola
Proceedings Volume 5755, (2005) https://doi.org/10.1117/12.599997
KEYWORDS: Etching, Plasma, Semiconducting wafers, Plasma etching, Wafer testing, Statistical analysis, Data modeling, Oxides, Error analysis, Process control
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