Dr. Christopher J. Raymond
Director Technology Development
SPIE Involvement:
Conference Program Committee | Author | Editor
Publications (28)

Proceedings Article | 10 April 2013 Paper
Proceedings Volume 8681, 86810P (2013) https://doi.org/10.1117/12.2013624
KEYWORDS: Light emitting diodes, Semiconducting wafers, Metrology, Manufacturing, Luminescence, Metalorganic chemical vapor deposition, Photons, Process control, Spatial resolution, Physics

Proceedings Article | 24 March 2006 Paper
Mike Littau, Darren Forman, Josh Bruce, Christopher Raymond, Steven Hummel
Proceedings Volume 6152, 615236 (2006) https://doi.org/10.1117/12.656729
KEYWORDS: Diffraction, Polarization, Scatterometry, Critical dimension metrology, Metrology, Analytical research, Measurement devices, Etching, Light scattering, Semiconductors

Proceedings Article | 24 March 2006 Paper
Darren Forman, Mike Littau, Christopher Raymond, Steven Hummel
Proceedings Volume 6152, 61524D (2006) https://doi.org/10.1117/12.656615
KEYWORDS: Scatterometry, Critical dimension metrology, Photomasks, Lithography, Photoresist materials, Scatter measurement, Diffraction gratings, Diffraction, Data modeling, Nano opto mechanical systems

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6152, 61521I (2006) https://doi.org/10.1117/12.656466
KEYWORDS: Scatterometry, Domes, Scatter measurement, Silicon, Clouds, Polarization, Diffraction, Atomic force microscopy, Critical dimension metrology, Semiconductors

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6152, 61521X (2006) https://doi.org/10.1117/12.656515
KEYWORDS: Scatterometry, Dielectrics, Atomic force microscopy, Etching, Critical dimension metrology, Metals, Semiconducting wafers, Back end of line, Optical properties, Metrology

Showing 5 of 28 publications
Proceedings Volume Editor (4)

Conference Committee Involvement (23)
Metrology, Inspection, and Process Control XXXIX
23 February 2025 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVIII
26 February 2024 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVII
27 February 2023 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVI
25 April 2022 | San Jose, California, United States
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
22 February 2021 | Online Only, California, United States
Showing 5 of 23 Conference Committees
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