Dr. Christophe Couderc
Computational Lithography Engineer at MINATEC
SPIE Involvement:
Author
Publications (24)

Proceedings Article | 28 March 2014 Paper
X. Chevalier, C. Nicolet, R. Tiron, Ahmed Gharbi, M. Argoud, C. Couderc, Guillaume Fleury, G. Hadziioannou, I. Iliopoulos, C. Navarro
Proceedings Volume 9049, 90490T (2014) https://doi.org/10.1117/12.2046329
KEYWORDS: Lithography, Molecular self-assembly, Picosecond phenomena, Statistical analysis, Polymers, Thin films, Binary data, Microelectronics, Polymethylmethacrylate, Scanning electron microscopy

Proceedings Article | 21 March 2012 Paper
R. Tiron, X. Chevalier, S. Gaugiran, J. Pradelles, H. Fontaine, C. Couderc, L. Pain, C. Navarro, T. Chevolleau, G. Cunge, M. Delalande, G. Fleury, G. Hadziioannou
Proceedings Volume 8323, 83230O (2012) https://doi.org/10.1117/12.916400
KEYWORDS: Lithography, Polymers, 193nm lithography, Electron beam lithography, Silicon, Etching, Photomasks, Picosecond phenomena, Plasma, Directed self assembly

Proceedings Article | 19 May 2008 Paper
Dan Rost, Raunak Mann, Ryan Gardner, Dana Bernstein, Dax Olvera, Simon Kurin, Christophe Couderc
Proceedings Volume 7028, 70282Q (2008) https://doi.org/10.1117/12.793096
KEYWORDS: Inspection, Neodymium, Photomasks, Reticles, Image processing, Defect detection, Semiconducting wafers, Airborne remote sensing, Manufacturing, Printing

Proceedings Article | 19 May 2008 Paper
Dan Rost, Michael Ben-Yishai, Lior Shoval, Christophe Couderc
Proceedings Volume 7028, 70281L (2008) https://doi.org/10.1117/12.793062
KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Inspection, Scanning electron microscopy, Reticles, Phase shifts, Airborne remote sensing, Etching, Metrology

Proceedings Article | 19 May 2008 Paper
Heebom Kim, MyoungSoo Lee, Sukho Lee, Young-Su Sung, Byunggook Kim, Sang-Gyun Woo, HanKu Cho, Michael Ben Yishai, Lior Shoval, Christophe Couderc
Proceedings Volume 7028, 70281K (2008) https://doi.org/10.1117/12.793061
KEYWORDS: Photomasks, Critical dimension metrology, Inspection, Semiconducting wafers, Scanning electron microscopy, Process control, Airborne remote sensing, Lithography, Defect inspection, Imaging systems

Showing 5 of 24 publications
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