Dr. Chisun Hong
at FUJIFILM Electronic Materials USA Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 20 March 2012 Paper
Giorgio Rafaelli, Fabio Ferri, Stefano Volpi, Chisun Hong
Proceedings Volume 8325, 83252D (2012) https://doi.org/10.1117/12.918015
KEYWORDS: Optical lithography, Scanning electron microscopy, Transparency, Photoresist processing, Image sensors, Diffusion, Photoresist materials, Charge-coupled devices, CMOS sensors, Semiconducting wafers

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.604401
KEYWORDS: Line edge roughness, Photoresist processing, Polymers, Line width roughness, Semiconducting wafers, Critical dimension metrology, Cadmium, Chemically amplified resists, Transistors, Optical lithography

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.537931
KEYWORDS: Polymers, Critical dimension metrology, Photoresist processing, Etching, Resistance, Lithography, Semiconducting wafers, Resist chemistry, Line edge roughness, Dry etching

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